Evaluation of residual stress in MEMS structures by means Digital Holography (Contributo in atti di convegno)

Type

• Contributo in atti di convegno (Classe)
• Prodotto della ricerca (Classe)

Label

• Evaluation of residual stress in MEMS structures by means Digital Holography (Contributo in atti di convegno) (literal)

Anno

• 2003-01-01T00:00:00+01:00 (literal)

Alternative label

• Coppola G, De Nicola S, Ferraro P, Finizio A, Grilli S, Iodice M, Magro C, Pierattini G (2003)
  Evaluation of residual stress in MEMS structures by means Digital Holography
  in SPIE: Speckle Metrology, Trondheim, Norway
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• Coppola G, De Nicola S, Ferraro P, Finizio A, Grilli S, Iodice M, Magro C, Pierattini G (literal)

Rivista

• Proceedings of SPIE (Rivista)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#note

• Proc. SPIE 4933, 226 (2003) (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#descrizioneSinteticaDelProdotto

• We investigate digital holography method as metrological tool for inspection and characterization of MEMS structures. The efficiency of the digital holography is demonstrated measuring out of plane deformations due to the intrinsic residual stress. Microstructures under investigation are of two different types: the first are made of a single polysilicon layer, whereas the second are bimorph structures with a thin silicon nitride layer over the polysilicon one. These structures exhibit an out-of-plane deformation owing to residual stresses between the different layers. The characterization of these deformations is instrumental to study and understand the effect of residual stress on the deformation of the single microstructures. To this aim digital holography has been applied as metrological tool in order to obtain the profile of the microstructures. These data are employed in analytical and numerical model to evaluate residual stress inside the investigated structures. Moreover, digital holography has been employed to evaluate MEMS behavior when subjected to thermal load. Profile of cantilevers, with dimensions from 1 to 50 µm, has been measured. (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• IMM-CNR Napoli; ICIB-CNR; INOA-CNR; STMicroelectronics Catania (literal)

Titolo

• Evaluation of residual stress in MEMS structures by means Digital Holography (literal)

Abstract

• We investigate digital holography method as metrological tool for inspection and characterization of MEMS structures. The efficiency of the digital holography is demonstrated measuring out of plane deformations due to the intrinsic residual stress. Microstructures under investigation are of two different types: the first are made of a single polysilicon layer, whereas the second are bimorph structures with a thin silicon nitride layer over the polysilicon one. These structures exhibit an out-of-plane deformation owing to residual stresses between the different layers. The characterization of these deformations is instrumental to study and understand the effect of residual stress on the deformation of the single microstructures. To this aim digital holography has been applied as metrological tool in order to obtain the profile of the microstructures. These data are employed in analytical and numerical model to evaluate residual stress inside the investigated structures. Moreover, digital holography has been employed to evaluate MEMS behavior when subjected to thermal load. Profile of cantilevers, with dimensions from 1 to 50 µm, has been measured (literal)

Prodotto di

• Microsensori e sistemi di sensing ottici (MD.P05.014.002) (Modulo)
• Institute for microelectronics and microsystems (IMM) (Istituto)

Autore CNR

• GIUSEPPE COPPOLA (Persona)
• MARIO IODICE (Unità di personale interno)
• PIETRO FERRARO (Unità di personale interno)

Incoming links:

Autore CNR di

• PIETRO FERRARO (Unità di personale interno)
• MARIO IODICE (Unità di personale interno)
• GIUSEPPE COPPOLA (Persona)

Prodotto

• Institute for microelectronics and microsystems (IMM) (Istituto)
• Microsensori e sistemi di sensing ottici (MD.P05.014.002) (Modulo)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Proceedings of SPIE (Rivista)