Low deposition temperature of microcrystalline silicon films by PECVD under high etching selectivity (Contributo in atti di convegno)

Type
Label
  • Low deposition temperature of microcrystalline silicon films by PECVD under high etching selectivity (Contributo in atti di convegno) (literal)
Anno
  • 2003-01-01T00:00:00+01:00 (literal)
Alternative label
  • A. Grimaldi, A. Sacchetti, M. Losurdo, M. Ambrico, P. Capezzuto and G. Bruno (2003)
    Low deposition temperature of microcrystalline silicon films by PECVD under high etching selectivity
    in ISPC 16 Taormina, Italy, June 21-27, 2003, Taormina, Italy
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • A. Grimaldi, A. Sacchetti, M. Losurdo, M. Ambrico, P. Capezzuto and G. Bruno (literal)
Titolo
  • Low deposition temperature of microcrystalline silicon films by PECVD under high etching selectivity (literal)
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