Fabrication and Characterization of Silica Opals (Contributo in atti di convegno)

Type
Label
  • Fabrication and Characterization of Silica Opals (Contributo in atti di convegno) (literal)
Anno
  • 2008-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.4028/www.scientific.net/AST.55.118 (literal)
Alternative label
  • C. Armellini, A. Chiappini, A. Chiasera, M. Ferrari, Y. Jestin, E. Moser, R. Retoux, G. Speranza, L. Minati, G. Nunzi Conti, S. Berneschi, I. Cacciari, S. Pelli, G.C. Righini (2008)
    Fabrication and Characterization of Silica Opals
    in 3rd International Conference ”Smart Materials, Structures and Systems”, Acireale, Sicily, Italy, 8 -13 June, 2008
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • C. Armellini, A. Chiappini, A. Chiasera, M. Ferrari, Y. Jestin, E. Moser, R. Retoux, G. Speranza, L. Minati, G. Nunzi Conti, S. Berneschi, I. Cacciari, S. Pelli, G.C. Righini (literal)
Pagina inizio
  • 118 (literal)
Pagina fine
  • 126 (literal)
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  • 55 (literal)
Rivista
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  • Advances in Science and Technology Vol. 55 (2008) pp 118-126. Invited lecture: Proceedings 3rd International Conference ”Smart Materials, Structures and Systems”, Acireale, Sicily, Italy, 8 -13 June, 2008 (literal)
Note
  • opu (literal)
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  • CNR-IFN, Istituto di Fotonica e Nanotecnologie, CSMFO Lab., Via alla Cascata, 56/C, 38050 Povo-Trento, Italy; Dipartimento di Fisica, Università di Trento, CSMFO Lab., via Sommarive 14, 38050 Povo-Trento, Italy; Lab.CRISMAT, UMR 6508, ENSICAEN, 6 Bld. Maréchal Juin, 14050 Caen, France; FBK-IRST, via Sommarive 18, 38050 Povo, Italy; Optoelectronic Technology Laboratory, Nello Carrara Institute of Applied Physics, IFAC - CNR, Via Madonna del Piano 10, 50019 Sesto Fiorentino (Firenze), Italy; Centro Fermi, Complesso del Viminale, 00184 Roma, Italy; CNR, Department of Materials and Devices, via dei Taurini 19, 00185 Roma, Italy (literal)
Titolo
  • Fabrication and Characterization of Silica Opals (literal)
Abstract
  • We present the details of the sol-gel processing used to realize inverse silica opal, where the silica was activated with 0.3 mol% of Er3+ ions. The template (direct opal) was obtained assembling polystyrene spheres of the dimensions of 260 nm by means of a vertical deposition technique. The Er3+-activated silica inverse opal was obtained infiltrating, into the void of the template, the silica sol doped with Er3+ ions and subsequently removing the polystyrene spheres by means of calcinations. Scanning electron microscope showed that the inverse opals possess an fcc structure with a air hollow of about 210 nm. A photonic band gap in the visible range was observed from reflectance measurements. Spectroscopic properties of Er 3+activated silica inverse opal were investigated by photoluminescence spectroscopy. A bandwidth of 21 nm was measured for the 4I13/2 -> 4I15/2 transition of Er3+ ions upon excitation at 514.5 nm. The luminescence decay curve of the 4I13/2 metastable state of the Er3+ ions presents a lifetime ? = 16.8 ± 0.1 ms giving a very high quantum efficiency of the fabricated system. Core-shell Er3+-activated silica spheres, where the core is the silica sphere and the shell is an Er 2O3-SiO2 coating is proposed as a possible route for opal fabrication. For core-shell system a quantum efficiency of about 70% was estimated. (literal)
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