Pulsed Laser Deposition of Er doped tellurite films on large area (Articolo in rivista)

Type
Label
  • Pulsed Laser Deposition of Er doped tellurite films on large area (Articolo in rivista) (literal)
Anno
  • 2007-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1088/1742-6596/59/1/102 (literal)
Alternative label
  • M. Bouazaoui, B. Capoen, A.P. Caricato, A. Chiasera, A. Fazzi, M. Ferrari, G. Leggieri, M. Martino, M. Mattarelli, M. Montagna, F. Romano, T. Tunno, S. Turrel, and K. Vishnubhatla (2007)
    Pulsed Laser Deposition of Er doped tellurite films on large area
    in Journal of physics. Conference series (Print)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • M. Bouazaoui, B. Capoen, A.P. Caricato, A. Chiasera, A. Fazzi, M. Ferrari, G. Leggieri, M. Martino, M. Mattarelli, M. Montagna, F. Romano, T. Tunno, S. Turrel, and K. Vishnubhatla (literal)
Pagina inizio
  • 475 (literal)
Pagina fine
  • 478 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 59 (literal)
Rivista
Note
  • Scopu (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • Laboratoire PhLAM, UMR 8523, Université des Sciences et Technologies de Lille, 59655 Villeneuve d'Ascq Cedex France, France; L3 Group, Dipartimento di Fisica, Via Arnesano, 73100 Lecce, Italy; CNR-IFN, CSMFO Group, via Sommarive 14, 38100 Povo-Trento, Italy; Physics Department, CSMFO Group, via Sommarive 14, 38100 Povo-Trento, Italy; Université des Sciences et Technologies de Lille, Laboratoire de Spectrochimie Infrarouge et Raman, Bât C5, 59655 - Villeneuve d'Ascq cedex, France (literal)
Titolo
  • Pulsed Laser Deposition of Er doped tellurite films on large area (literal)
Abstract
  • Thin films of Er3+-doped tungsten tellurite glass have been prepared by the pulsed laser deposition technique using an ArF excimer laser. The depositions were performed at different O2 pressure (5, 10 Pa) and at different substrate temperatures (RT, 100°C and 200°C). The composition and the optical properties of the deposited films, such as transmission, dispersion curves of refraction index and extinction coefficient, and film thickness were studied for the different deposition parameters. Transparent films at the highest substrate temperature were obtained only for a higher oxygen pressure with respect to the RT conditions (literal)
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