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Chemical vapor deposited Fe2O3 thin films analyzed by XPS (Articolo in rivista)

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Chemical vapor deposited Fe2O3 thin films analyzed by XPS (Articolo in rivista) (literal)

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D. Barreca,1 G.A. Battiston,2 D. Berto,2 R. Gerbasi,2 E. Tondello3 (2001)
Chemical vapor deposited Fe2O3 thin films analyzed by XPS
in Surface science spectra
(literal)

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1: ISTM-CNR and INSTM, Dipartimento C.I.M.A., Via Marzolo, 1 - 35131 Padova, Italy 2: ICIS-CNR, Corso Stati Uniti, 4-35127 Padova, Italy 3: Università di Padova, Dipartimento C.I.M.A., Via Loredan, 4 - 35131 Padova, Italy (literal)

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Abstract

In the present study, x-ray photoelectron spectroscopy (XPS) was employed to investigate the principal core levels of a Fe2O3 thin film. The sample was deposited on glass in a N2 + O2 atmosphere by chemical vapor deposition (CVD), using Fe(acac)3 (Hacac = 2,4-pentanedione) as the source compound. XPS surface data for the Fe 2p3/2, O1s, and C 1s photoelectrons, obtained by an Al Ka monochromatized excitation source, are reported. Deconvolution of the O 1s signal revealed the presence of -OH groups along with the major component ascribed to lattice oxygen. The relatively high carbon content in the film indicated an incomplete decomposition of the used precursor. (literal)

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