Random deposition model with a constant capture length (Articolo in rivista)

Type
Label
  • Random deposition model with a constant capture length (Articolo in rivista) (literal)
Anno
  • 2005-01-01T00:00:00+01:00 (literal)
Alternative label
  • Politi P., Saito Y. (2005)
    Random deposition model with a constant capture length
    in Progress of theoretical physics
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Politi P., Saito Y. (literal)
Pagina inizio
  • 15 (literal)
Pagina fine
  • 28 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 113 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#note
  • fasc. (1). PTP. (literal)
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • 1) Istituto dei Sistemi Complessi, CNR, Via Madonna del Piano, 50019 Sesto Fiorentino, Italy 2) Istituto Nazionale per la Fisica della Materia, UdR Firenze, Via G. Sansone 1, 50019 Sesto Fiorentino, Italy 3) Department of Physics, Keio University, Yokohama 223-8522, Japan (literal)
Titolo
  • Random deposition model with a constant capture length (literal)
Abstract
  • We introduce a sequential model for the deposition and aggregation of particles in the submonolayer regime. Once a particle has been randomly deposited on the substrate, it sticks to the closest atom or island within a distance l, otherwise it sticks to the deposition site. We study this model both numerically and analytically in one dimension. A clear comprehension of its statistical properties is provided, thanks to capture equations and to the analysis of the island-island distance distribution. (literal)
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Autore CNR

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