Parallel Writing by Local Oxidation Nanolithography with sub-Micrometer Resolution (Articolo in rivista)

Type

• Prodotto della ricerca (Classe)
• Articolo in rivista (Classe)

Label

• Parallel Writing by Local Oxidation Nanolithography with sub-Micrometer Resolution (Articolo in rivista) (literal)

Anno

• 2003-01-01T00:00:00+01:00 (literal)

Alternative label

• M. Cavallini 1, P. Mei 2, F. Biscarini 3, R. García 4 (2003)
  Parallel Writing by Local Oxidation Nanolithography with sub-Micrometer Resolution
  in Applied physics letters
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• M. Cavallini 1, P. Mei 2, F. Biscarini 3, R. García 4 (literal)

Pagina inizio

• 5286 (literal)

Pagina fine

• 5288 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 83 (literal)

Rivista

• Applied physics letters (Rivista)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#descrizioneSinteticaDelProdotto

• articolo (literal)

Note

• ISI Web of Science (WOS) (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• 1,2,3 - CNR-ISMN Sez. di Bologna, Italy 4, CSIC-IMM (literal)

Titolo

• Parallel Writing by Local Oxidation Nanolithography with sub-Micrometer Resolution (literal)

Abstract

• We demonstrate that the process of local oxidation of surfaces by atomic force microscopy (AFM) can be upscaled in a straightforward way by using a solid support with multiple protrusions as the cathode electrode. A metallized digital video disk polymeric support has been used as a stamp to generate an array of features of variable length and 100 nm in width on a silicon surface covering a 5x6 mm2 region. The parallel patterning involves the formation of as many liquid bridges as protrusions are in the stamp. The growth rate of the parallel local oxides is slightly smaller than the one obtained by atomic force microscopy experiments. Nonetheless results from AFM local oxidation experiments can be readily extended to parallel oxidation which in turns opens the possibility of patterning cm2 regions with 10 nm motives. (literal)

Prodotto di

• Istituto per lo studio dei materiali nanostrutturati (ISMN) (Istituto)

Autore CNR

• MASSIMILIANO CAVALLINI (Unità di personale interno)
• FABIO BISCARINI (Unità di personale interno)

Insieme di parole chiave

• Keywords of "Parallel Writing by Local Oxidation Nanolithography with sub-Micrometer Resolution" (Insieme di parole chiave)

Incoming links:

Autore CNR di

• MASSIMILIANO CAVALLINI (Unità di personale interno)
• FABIO BISCARINI (Unità di personale interno)

Prodotto

• Istituto per lo studio dei materiali nanostrutturati (ISMN) (Istituto)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Applied physics letters (Rivista)

Insieme di parole chiave di

• Keywords of "Parallel Writing by Local Oxidation Nanolithography with sub-Micrometer Resolution" (Insieme di parole chiave)