http://www.cnr.it/ontology/cnr/individuo/prodotto/ID52070
Isotopic effect in deuterium-induced semiconductor surface metallization: D/3C-SiC(100) 3×2 (Articolo in rivista)
- Type
- Label
- Isotopic effect in deuterium-induced semiconductor surface metallization: D/3C-SiC(100) 3×2 (Articolo in rivista) (literal)
- Anno
- 2006-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1063/1.2243801 (literal)
- Alternative label
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Roy J.; Aristov V.Yu.; Radtke C.; Jaffrennou P.; Enriquez H.; Soukiassian P.; Moras P.; Spezzani C.; Crotti C.; Perfetti P. (literal)
- Pagina inizio
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
- Rivista
- Note
- Scopus (literal)
- Google Scholar (literal)
- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- CEA, Laboratoire SIMA, Saclay, France
CNR - ISM
Sincrotrone Trieste
Russian Academy of Sciences, Chernogolovka, Moscow District, Russian Federation
Universidade Federal do Rio Grande do Sul, Porto Alegre RS, Brazil (literal)
- Titolo
- Isotopic effect in deuterium-induced semiconductor surface metallization: D/3C-SiC(100) 3×2 (literal)
- Abstract
- Atomic deuterium (D) interaction with the polar 3C-SiC(100) 3×2 surface is investigated by synchrotron radiation-based valence band and core level photoemission. D is found to induce metallization of the surface. The D atoms lead to a charge transfer into the topmost Si and C planes, with D atoms terminating top surface dangling bond and an asymmetric attack in the third Si plane. However, a significant isotopic effect is observed when compared to the H-induced metallization with amazingly smaller charge transfer suggesting dynamical effects. (literal)
- Prodotto di
- Autore CNR
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