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Chemical Vapor Deposition of lanthanum oxyfluoride-based thin films from a lanthanum beta-diketonate diglyme Precursor\" (Articolo in rivista)

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Chemical Vapor Deposition of lanthanum oxyfluoride-based thin films from a lanthanum beta-diketonate diglyme Precursor\" (Articolo in rivista) (literal)

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D. Barreca, A. Gasparotto, C. Maragno, E. Tondello, E. Bontempi, L.E. Depero, C. Sada (2005)
Chemical Vapor Deposition of lanthanum oxyfluoride-based thin films from a lanthanum beta-diketonate diglyme Precursor"
in Chemical vapor deposition (Print)
(literal)

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D. Barreca, A. Gasparotto, C. Maragno, E. Tondello, E. Bontempi, L.E. Depero, C. Sada (literal)

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1: ISTM-CNR and INSTM - Department of Chemistry - Padova University - Via Marzolo, 1 - 35131 Padova, Italy 2,3,4: Department of Chemistry - Padova University and INSTM - Via Marzolo, 1 - 35131 Padova, Italy. 5,6: Chemistry for Technologies Laboratory and INSTM - Brescia University - Via Branze, 38 - 25123 Brescia, Italy 7: INFM and Physics Department - Padova University - Via Marzolo, 8 - 35131 Padova, Italy. (literal)

Titolo

Chemical Vapor Deposition of lanthanum oxyfluoride-based thin films from a lanthanum beta-diketonate diglyme Precursor\" (literal)

Abstract

Lanthanum oxyfluoride-based thin films were grown on SiO2 and Si(100) by CVD from La(hfa)3?diglyme (Hhfa=1,1,1,5,5,5-hexafluoro-2,4-pentanedione; diglyme=bis(2-metoxyethyl)ether), acting both as lanthanum and fluorine source. Film syntheses were performed in nitrogen+wet oxygen atmosphere, with particular attention to the structural and compositional evolution as a function of the deposition temperature (200-500°C). To this aim, specimens were subjected to a multi-technique characterization by means of Glancing Incidence X-Ray Diffraction (GIXRD), X-ray Photoelectron Spectroscopy (XPS), Secondary Ion Mass Spectrometry (SIMS) and Atomic Force Microscopy (AFM). The formation of nanophasic (crystallite size <30 nm) LaOF-containing films, with a cleaner precursor conversion at the highest deposition temperatures, is evidenced and discussed, highlighting the most critical parameters for the obtainment of lanthanum oxyfluoride coatings with controlled properties. (literal)

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