http://www.cnr.it/ontology/cnr/individuo/prodotto/ID3781
Electron beam writing of epoxy based sol-gel materials (Articolo in rivista)
- Type
- Label
- Electron beam writing of epoxy based sol-gel materials (Articolo in rivista) (literal)
- Anno
- 2008-01-01T00:00:00+01:00 (literal)
- Alternative label
Della Giustina, G; Guglielmi, M; Brusatin, G; Prasciolu, M; Romanato, F (2008)
Electron beam writing of epoxy based sol-gel materials
in Journal of sol-gel science and technology
(literal)
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- Della Giustina, G; Guglielmi, M; Brusatin, G; Prasciolu, M; Romanato, F (literal)
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- Pagina fine
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- Rivista
- Note
- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- \"[Della Giustina, G.; Guglielmi, M.; Brusatin, G.] Univ Padua, Dept Mech Engn, Mat Sect, Padua, Italy; [Prasciolu, M.; Romanato, F.] INFM CNR, TASC Lab, I-34012 Trieste, Italy; [Romanato, F.] Univ Padua, Dept Phys, Padua, Italy (literal)
- Titolo
- Electron beam writing of epoxy based sol-gel materials (literal)
- Abstract
- We report the use of an epoxy based hybrid sol-gel material as negative resist for electron beam lithography (EBL). The matrix has been prepared starting from 3-glycidoxypropyltrimethoxysilane as specific organic-inorganic precursor and the synthesis has been strictly controlled in order to preserve the epoxy ring and to obtain a proper inorganic cross-linking degree. The film has been exposed to an electron beam, inducing the polymerization of the organic part and generating the film hardening. Preliminary results of a resolution test on the synthesized epoxy based sol-gel material, performed with electron beam lithography, are presented. Structures below 300 nm were achieved. The direct nanopatterning of this hybrid sol-gel system simplify the nanofabrication process and can be exploited in the realization of photonic devices. A demonstration has been carried out doping the hybrid films with commercial Rhodamine 6G and reproducing an already tested laser structure. (literal)
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