Structural and morphological characterisation of heteroepitaxial CeO2 films grown on YSZ (100) and TiO2 (001) by metal-organic chemical vapour deposition (Articolo in rivista)

Type

• Prodotto della ricerca (Classe)
• Articolo in rivista (Classe)

Label

• Structural and morphological characterisation of heteroepitaxial CeO2 films grown on YSZ (100) and TiO2 (001) by metal-organic chemical vapour deposition (Articolo in rivista) (literal)

Anno

• 2003-01-01T00:00:00+01:00 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi

• 10.1016/S0921-5107(02)00646-3 (literal)

Alternative label

• Lo Nigro, R; Malandrino, G; Fragala, IL (2003)
  Structural and morphological characterisation of heteroepitaxial CeO2 films grown on YSZ (100) and TiO2 (001) by metal-organic chemical vapour deposition
  in Materials Science and Engineering B; ELSEVIER SCIENCE SA, PO BOX 564, 1001 LAUSANNE (Svizzera)
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• Lo Nigro, R; Malandrino, G; Fragala, IL (literal)

Pagina inizio

• 323 (literal)

Pagina fine

• 326 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 102 (literal)

Rivista

• Materials Science and Engineering B (Rivista)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali

• 4 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo

• 1-3 (literal)

Note

• ISI Web of Science (WOS) (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• Univ Catania, Dipartimento Sci Chim, INSTM, I-95125 Catania, Italy; CNR, IMM, Sez Catania, I-95125 Catania, Italy (literal)

Titolo

• Structural and morphological characterisation of heteroepitaxial CeO2 films grown on YSZ (100) and TiO2 (001) by metal-organic chemical vapour deposition (literal)

Abstract

• We report on the deposition of <100> CeO2 buffer layers by metal-organic chemical vapour deposition (MOCVD) on TiO2(001) and YSZ(100) substrates from Ce(111) 1,1,1,5,5,5-hexafluoro-2,4-pentanedionato diglyme adduct (Ce(hfa)(3).diglyme). X-ray diffraction techniques (theta-2theta, omega-scans, pole figures) have been used to determine out-of-plane and in-plane alignments of CeO2 films. Films on both YSZ(100) and TiO2 (001) are <100> oriented beyond 450 degreesC deposition temperatures. Rocking curve full width half maximum (FWHM) values and pole figure patterns point to good out-of-plane and in-plane alignments. Epitaxial growth on rutile substrate is obtained below 750 degreesC. Morphological characterisation indicates smooth and homogeneous surfaces. (literal)

Editore

• ELSEVIER SCIENCE SA (Editore)

Prodotto di

• Institute for microelectronics and microsystems (IMM) (Istituto)
• Materiali multifunzionali, e innovativi per componenti integrati (MD.P05.003.002) (Modulo)

Autore CNR

• RAFFAELLA LO NIGRO (Unità di personale interno)

Insieme di parole chiave

• Parole chiave di "Structural and morphological characterisation of heteroepitaxial CeO2 films grown on YSZ (100) and TiO2 (001) by metal-organic chemical vapour deposition" (Insieme di parole chiave)

Incoming links:

Prodotto

• Institute for microelectronics and microsystems (IMM) (Istituto)
• Materiali multifunzionali, e innovativi per componenti integrati (MD.P05.003.002) (Modulo)

Autore CNR di

• RAFFAELLA LO NIGRO (Unità di personale interno)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Materials Science and Engineering B (Rivista)

Editore di

• ELSEVIER SCIENCE SA (Editore)

Insieme di parole chiave di

• Parole chiave di "Structural and morphological characterisation of heteroepitaxial CeO2 films grown on YSZ (100) and TiO2 (001) by metal-organic chemical vapour deposition" (Insieme di parole chiave)