Tailoring the long-range order of block copolymer based nanomasks on flat substrates (Articolo in rivista)

Type

• Prodotto della ricerca (Classe)
• Articolo in rivista (Classe)

Label

• Tailoring the long-range order of block copolymer based nanomasks on flat substrates (Articolo in rivista) (literal)

Anno

• 2007-01-01T00:00:00+01:00 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi

• 10.1063/1.2766694 (literal)

Alternative label

• Puglisi RA; La Fata P; Lombardo S (2007)
  Tailoring the long-range order of block copolymer based nanomasks on flat substrates
  in Applied physics letters; American Institute of Physics, Melville [NY] (Stati Uniti d'America)
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• Puglisi RA; La Fata P; Lombardo S (literal)

Pagina inizio

• 53104-1 (literal)

Pagina fine

• 53104-3 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url

• http://apps.webofknowledge.com/full_record.do?product=WOS&search_mode=DaisyMultiClustViewRecords&qid=50&SID=W2f1cL3pCalf9n67ah8&page=1&doc=8 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 91 (literal)

Rivista

• Applied physics letters (Rivista)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali

• 3 (literal)

Note

• ISI Web of Science (WOS) (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• CNR-IMM, I-95121 Catania, Italy (literal)

Titolo

• Tailoring the long-range order of block copolymer based nanomasks on flat substrates (literal)

Abstract

• The authors investigate the self-assembling of polystyrene/polymethylmethacrylate block copolymer films for the formation of nanotemplates on flat substrates. The macrodomain evolution is studied in terms of density, size, and relative orientation during the annealing promoting the self-assembling. The statistics is acquired through an original method based on the elaboration of the electronic micrographs in the reciprocal space. The results indicate that while the annealing conditions do not play a role in the pore-to-pore distance distribution, thus confirming previous results, they influence the macrodomain density and size distributions, inducing an onset of secondary grain growth crystallization behavior in this system. (literal)

Editore

• American Institute of Physics (Editore)

Prodotto di

• TRASPORTO IN MOS SCALATI E NUOVE STRUTTURE (MD.P05.008.001) (Modulo)
• Nanostrutture definite per auto-assemblamento (MD.P05.008.003) (Modulo)
• Institute for microelectronics and microsystems (IMM) (Istituto)

Autore CNR

• SALVATORE LOMBARDO (Persona)
• ROSARIA ANNA PUGLISI (Persona)

Insieme di parole chiave

• Parole chiave di "Tailoring the long-range order of block copolymer based nanomasks on flat substrates" (Insieme di parole chiave)

Incoming links:

Prodotto

• Institute for microelectronics and microsystems (IMM) (Istituto)
• TRASPORTO IN MOS SCALATI E NUOVE STRUTTURE (MD.P05.008.001) (Modulo)
• Nanostrutture definite per auto-assemblamento (MD.P05.008.003) (Modulo)

Autore CNR di

• ROSARIA ANNA PUGLISI (Persona)
• SALVATORE LOMBARDO (Persona)

Editore di

• American Institute of Physics (Editore)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Applied physics letters (Rivista)

Insieme di parole chiave di

• Parole chiave di "Tailoring the long-range order of block copolymer based nanomasks on flat substrates" (Insieme di parole chiave)