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Nd3+-doped fluoride film grown on LiYF4 substrate by pulsed laser deposition (Articolo in rivista)

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Nd3+-doped fluoride film grown on LiYF4 substrate by pulsed laser deposition (Articolo in rivista) (literal)

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Barsanti, S; Comacchia, F; Di Lieto, A; Toncelli, A; Tonelli, M; Bicchi, P (2008)
Nd3+-doped fluoride film grown on LiYF4 substrate by pulsed laser deposition
in Thin solid films (Print)
(literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

Barsanti, S; Comacchia, F; Di Lieto, A; Toncelli, A; Tonelli, M; Bicchi, P (literal)

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\"[Barsanti, S.; Bicchi, P.] Univ Siena, Dept Phys, I-53100 Siena, Italy; [Comacchia, F.; Di Lieto, A.] Scuola Normale Super Pisa, NEST, I-56126 Pisa, Italy; [Toncelli, A.; Tonelli, M.] Univ Pisa, NEST, Dept Phys, I-56127 Pisa, Italy (literal)

Titolo

Nd3+-doped fluoride film grown on LiYF4 substrate by pulsed laser deposition (literal)

Abstract

The realization of a monocrystalline nanofilm of Nd3+-doped fluoride on LiYF4 substrates by pulsed laser deposition is reported. The film was obtained by laser ablation with 355 run photons of a bulk LiYF4 crystal doped with Nd3+ ions at 1.5% atomic concentration. The measurements of the sample thickness obtained by an in situ interferometric technique, and the film optical characteristics analyzed via laser induced fluorescence spectroscopy upon UV and IR excitation, are presented. Lifetime measurements of the fundamental Nd3+ ion transition in the film were also performed. All the results were compared with those obtained in a Nd3+:LiYF4 bulk crystal. The emission spectra of the deposited film following IR excitation seem to indicate the obtained deposit is Nd3+:YF3. (c) 2007 Elsevier B.V All rights reserved. (literal)

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