Silicon heterojunction solar cells with p nanocrystalline thin emitter on monocrystalline substrate (Articolo in rivista)

Type
Label
  • Silicon heterojunction solar cells with p nanocrystalline thin emitter on monocrystalline substrate (Articolo in rivista) (literal)
Anno
  • 2004-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1016/j.tsf.2003.11.010 (literal)
Alternative label
  • Zignani F; Desalvo A; Centurioni E; Iencinella D; Rizzoli R; Summonte C; Migliori A (2004)
    Silicon heterojunction solar cells with p nanocrystalline thin emitter on monocrystalline substrate
    in Thin solid films (Print); Elsevier Sequoia, Lausanne (Svizzera)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Zignani F; Desalvo A; Centurioni E; Iencinella D; Rizzoli R; Summonte C; Migliori A (literal)
Pagina inizio
  • 350 (literal)
Pagina fine
  • 354 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url
  • http://dx.doi.org/10.1016/j.tsf.2003.11.010 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 451-452 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali
  • 5 (literal)
Note
  • Scopu (literal)
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • CNR - IMM BO, I-40129 Bologna, Italy Univ Bologna, DICASM, I-40136 Bologna, Italy (literal)
Titolo
  • Silicon heterojunction solar cells with p nanocrystalline thin emitter on monocrystalline substrate (literal)
Abstract
  • In the framework of plasma deposition of silicon heterojunction solar cells, the issue of depositing by very high frequency, a microcrystalline emitter, without affecting the passivating properties of the underlying amorphous buffer layer, is addressed. The sequence, deposition-exposure to H-2 plasma-deposition, was used to fabricate the microcrystalline emitter. Using high-resolution transmission electron microscopy, we give microscopic evidence of the long-range effects of hydrogen, already inferred by large area optical techniques. Upon exposure to H-2 plasma, it is observed that silicon nanocrystallites are formed within the amorphous layer. Thinner amorphous layers undergo etching, and epitaxial growth takes place from the substrate. Photovoltaic devices with open circuit voltage up to 638 mV were fabricated. (literal)
Editore
Prodotto di
Autore CNR
Insieme di parole chiave

Incoming links:


Autore CNR di
Prodotto
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi
Editore di
Insieme di parole chiave di
data.CNR.it