Amorphous carbon deposited by pulsed laser ablation as material for cold cathode flat emitters (Articolo in rivista)

Type
Label
  • Amorphous carbon deposited by pulsed laser ablation as material for cold cathode flat emitters (Articolo in rivista) (literal)
Anno
  • 2002-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1016/S0169-4332(01)00711-5 (literal)
Alternative label
  • Angelucci R., Rizzoli R., Salvatori S., Nicoletti S., Migliori A., Brugnoli E., (2002)
    Amorphous carbon deposited by pulsed laser ablation as material for cold cathode flat emitters
    in Applied surface science; North Holland Pub. Co., Amsterdam (Paesi Bassi)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Angelucci R., Rizzoli R., Salvatori S., Nicoletti S., Migliori A., Brugnoli E., (literal)
Pagina inizio
  • 423 (literal)
Pagina fine
  • 428 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 186 (literal)
Rivista
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • CNR LAMEL--Institute, via Gobetti 101, 40129 Bologna, Italy INFM Dipartimento di Ingegneria Elettronica, via della Vasca Navale 84, 00146 Roma, Italy (literal)
Titolo
  • Amorphous carbon deposited by pulsed laser ablation as material for cold cathode flat emitters (literal)
Abstract
  • Pulsed laser deposition of carbon-based materials has been explored in order to obtain cold cathode flat emitters with high emission current density and low threshold field, and to examine the factors controlling the electron field emission behaviour. In this paper, results on amorphous carbon thin films deposited on silicon by pulsed laser ablation (PLA) from a graphite target, using a KrF excimer laser are presented. The structure and surface morphology of carbon materials have been examined by transmission electron microscopy (TEM) and Raman spectroscopy. I–V characteristics of the carbon films have been measured by a diode technique (below 10-4Pa). Some effects of the deposition parameters on thin film uniformity, adhesion, and field emission performances have been investigated. Emission current density as high as 50mA/cm2 at an electric field of 70V/µm has been obtained on 100nm thick, smooth and glassy carbon films deposited at 150°C. (literal)
Editore
Prodotto di
Autore CNR
Insieme di parole chiave

Incoming links:


Autore CNR di
Prodotto
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi
Editore di
Insieme di parole chiave di
data.CNR.it