GC-MS Investigation of Organosilicon and Fluorocarbon Fed Plasmas (Articolo in rivista)

Type
Label
  • GC-MS Investigation of Organosilicon and Fluorocarbon Fed Plasmas (Articolo in rivista) (literal)
Anno
  • 2011-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1002/ctpp.201000051 (literal)
Alternative label
  • F. Fanelli; F. Fracassi; S. Lovascio; R. d'Agostino (2011)
    GC-MS Investigation of Organosilicon and Fluorocarbon Fed Plasmas
    in Contributions to plasma physics (1985)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • F. Fanelli; F. Fracassi; S. Lovascio; R. d'Agostino (literal)
Pagina inizio
  • 137 (literal)
Pagina fine
  • 142 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 51 (literal)
Rivista
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • Department of Chemistry, University of Bari Aldo Moro, CNR-IMIP, Bari, Italy (literal)
Titolo
  • GC-MS Investigation of Organosilicon and Fluorocarbon Fed Plasmas (literal)
Abstract
  • This paper deals with the GC-MS investigation of the exhaust gas of atmospheric pressure PE-CVD processes in organosilicon- and fluorocarbon-containing dielectric barrier discharges. The extent of unreacted monomer and the quali-quantitative distribution of by-products have been investigated as a function of the feed composition. The results confirm that GC-MS is a powerful indirect diagnostic technique of the plasma phase since it allows to hypothesize some of the reactive moieties formed in the plasma and to clarify some aspects of the deposition mechanism. (literal)
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Autore CNR

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