Role of plasma activation in tailoring the nanostructure of multifunctional oxides thin films (Articolo in rivista)

Type
Label
  • Role of plasma activation in tailoring the nanostructure of multifunctional oxides thin films (Articolo in rivista) (literal)
Anno
  • 2009-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1016/j.apsusc.2008.08.103 (literal)
Alternative label
  • M.M. Giangregorio; M. Losurdo; P. Capezzuto; G. Bruno (2009)
    Role of plasma activation in tailoring the nanostructure of multifunctional oxides thin films
    in Applied surface science
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • M.M. Giangregorio; M. Losurdo; P. Capezzuto; G. Bruno (literal)
Pagina inizio
  • 5396 (literal)
Pagina fine
  • 5400 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 255 (literal)
Rivista
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • Univ Bari, Inst Inorgan Methodol & Plasmas, IMIP CNR, I-70125 Bari, Italy (literal)
Titolo
  • Role of plasma activation in tailoring the nanostructure of multifunctional oxides thin films (literal)
Abstract
  • Potential of O(2) remote plasmas for improving structural, morphological and optical properties of various multifunctional oxides thin films both during plasma assisted growth as well as by post-growth treatments is discussed. In particular, an O(2) remote plasma metalorganic chemical vapor deposition (RP-MOCVD) route is presented for tailoring the structural, morphological and optical properties of Er(2)O(3) and ZnO films. Furthermore, post-growth room-temperature remote O(2) plasma treatments of indium-tin-oxides (ITO) films are demonstrated to be effective in improving morphology of ITO. lms (literal)
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