A Study of the Temperature-Dependent Interaction of 4H-SiC and 6H-SiC Surfaces with Atomic Hydrogen (Articolo in rivista)

Type

• Prodotto della ricerca (Classe)
• Articolo in rivista (Classe)

Label

• A Study of the Temperature-Dependent Interaction of 4H-SiC and 6H-SiC Surfaces with Atomic Hydrogen (Articolo in rivista) (literal)

Anno

• 2004-01-01T00:00:00+01:00 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi

• 10.1063/1.1748845 (literal)

Alternative label

• M. Losurdo, G. Bruno, A.S. Brown, T.H.Kim (2004)
  A Study of the Temperature-Dependent Interaction of 4H-SiC and 6H-SiC Surfaces with Atomic Hydrogen
  in Applied physics letters
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• M. Losurdo, G. Bruno, A.S. Brown, T.H.Kim (literal)

Pagina inizio

• 4011 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 84 (literal)

Rivista

• Applied physics letters (Rivista)

Note

• ISI Web of Science (WOS) (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• [ 1 ] CNR, IMIP, Inst Inorgan Methodol & Plasmas, I-70126 Bari, Italy [ 2 ] Duke Univ, Dept Elect & Comp Engn, Durham, NC 27709 USA (literal)

Titolo

• A Study of the Temperature-Dependent Interaction of 4H-SiC and 6H-SiC Surfaces with Atomic Hydrogen (literal)

Abstract

• The interaction of 4H- and 6H-SiC (0001)(Si) surfaces with atomic hydrogen produced by a remote rf plasma source is investigated. The impact of the low temperature (200degreesC) and high temperature (750degreesC) interaction on chemical and morphological surface modifications is addressed with in situ real time monitoring using spectroscopic ellipsometry. It is found that the interaction of SiC surfaces with atomic hydrogen at 200degreesC is suitable for producing clean, atomically ordered, smooth and terraced surfaces with a stoichiometry associated with a root3xroot3R30degrees reconstruction, ideal for GaN heteroepitaxy. (literal)

Prodotto di

• Plasmi per la Scienza dei Materiali (MD.P03.025.001) (Modulo)
• Istituto di Nanotecnologia (NANOTEC) (Istituto)

Autore CNR

• MARIA LOSURDO (Unità di personale interno)
• GIOVANNI BRUNO (Unità di personale interno)

Incoming links:

Prodotto

• Istituto di Nanotecnologia (NANOTEC) (Istituto)
• Plasmi per la Scienza dei Materiali (MD.P03.025.001) (Modulo)

Autore CNR di

• GIOVANNI BRUNO (Unità di personale interno)
• MARIA LOSURDO (Unità di personale interno)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Applied physics letters (Rivista)