A study of anion Exchange Reactions at GaAs surfaces for heterojunction interface control (Articolo in rivista)

Type

• Prodotto della ricerca (Classe)
• Articolo in rivista (Classe)

Label

• A study of anion Exchange Reactions at GaAs surfaces for heterojunction interface control (Articolo in rivista) (literal)

Anno

• 2004-01-01T00:00:00+01:00 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi

• 10.1051/epjap:2004032 (literal)

Alternative label

• M. Losurdo, D. Giuva, P. Capezzuto, G. Bruno, T. Brown, G. Triplett, G. May, A.S-. Brown (2004)
  A study of anion Exchange Reactions at GaAs surfaces for heterojunction interface control
  in EPJ. Applied physics (Print)
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• M. Losurdo, D. Giuva, P. Capezzuto, G. Bruno, T. Brown, G. Triplett, G. May, A.S-. Brown (literal)

Pagina inizio

• 5 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 799 (literal)

Rivista

• EPJ. Applied physics (Rivista)

Note

• ISI Web of Science (WOS) (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• [ 1 ] Univ Bari, Inst Inorgan Methodol & Plasmas, IMIP, CNR, I-70126 Bari, Italy [ 2 ] Univ Bari, Dept Chem, INSTM Unit, I-70126 Bari, Italy (literal)

Titolo

• A study of anion Exchange Reactions at GaAs surfaces for heterojunction interface control (literal)

Abstract

• Fully microcrystalline silicon, muc-Si, thin films (<100 nm) have been deposited at low temperature (60 degreesC) on Corning glass and plastic flexible polyimide substrates by plasma enhanced chemical vapor deposition (PECVD) using SiF4-H-2-He. The effect of deposition temperature on the structure, i.e., crystallinity and density, of muc-Si films is investigated by spectroscopic ellipsometry in the 1.5-5.5 eV energy range. Modeling of spectroscopic ellipsometry data is used for highlighting crystallinity of the substrate/film interface, i.e., the absence of any amorphous incubation layer. It is found that film crystallinity does not depend on film thickness, and it increases with the decrease of deposition temperature. The temperature dependence is explained on the basis of a like-Arrhenius kinetic analysis of the etching process by atomic fluorine and hydrogen of both muc-Si and a-Si phases. (literal)

Prodotto di

• Plasmi per la Scienza dei Materiali (MD.P03.025.001) (Modulo)
• Istituto di Nanotecnologia (NANOTEC) (Istituto)

Autore CNR

• MARIA LOSURDO (Unità di personale interno)
• GIOVANNI BRUNO (Unità di personale interno)
• PIO CAPEZZUTO (Persona)

Incoming links:

Prodotto

• Istituto di Nanotecnologia (NANOTEC) (Istituto)
• Plasmi per la Scienza dei Materiali (MD.P03.025.001) (Modulo)

Autore CNR di

• GIOVANNI BRUNO (Unità di personale interno)
• MARIA LOSURDO (Unità di personale interno)
• PIO CAPEZZUTO (Persona)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• EPJ. Applied physics (Rivista)