RF plasma reactive pulsed laser deposition of boron nitride thin films (Articolo in rivista)

Type
Label
  • RF plasma reactive pulsed laser deposition of boron nitride thin films (Articolo in rivista) (literal)
Anno
  • 2005-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1016/j.apsusc.2005.01.085 (literal)
Alternative label
  • Mitu B.; Bilkova P. ; Marotta V. ; Orlando S. ; Santagata A. (2005)
    RF plasma reactive pulsed laser deposition of boron nitride thin films
    in Applied surface science
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Mitu B.; Bilkova P. ; Marotta V. ; Orlando S. ; Santagata A. (literal)
Pagina inizio
  • 123 (literal)
Pagina fine
  • 127 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url
  • http://www.sciencedirect.com/science/article/pii/S016943320500173X (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 247 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali
  • 5 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
  • 1-4 (literal)
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • CNR, IMIP, PZ, I-85050 Tito, PZ, Italy (literal)
Titolo
  • RF plasma reactive pulsed laser deposition of boron nitride thin films (literal)
Abstract
  • Thin films of boron nitride (BN) have been deposited on Si(1 0 0) substrates by reactive pulsed laser ablation (PLA) of a boron target in the presence of a 13.56 MHz radio frequency (RF) nitrogen plasma. The gaseous species have been deposited at several substrate temperatures, using the on-axis configuration. The film properties have been investigated by Scanning Electron Microscopy, Atomic Force Microscopy, Fourier Transformed Infrared Spectroscopy, and X-ray diffraction characterization techniques, and compared to those resulting from the conventional PLA method. The behavior of hexagonal-BN and cubic-BN phases grown by PLA as function of substrate temperature is also reported. (literal)
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