Multilayered metal oxide thin film gas sensors obtained by conventional and RF plasma-assisted laser ablation (Articolo in rivista)

Type

• Articolo in rivista (Classe)
• Prodotto della ricerca (Classe)

Label

• Multilayered metal oxide thin film gas sensors obtained by conventional and RF plasma-assisted laser ablation (Articolo in rivista) (literal)

Anno

• 2006-01-01T00:00:00+01:00 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi

• 10.1016/j.apsusc.2005.07.102 (literal)

Alternative label

• Mitu B. ; Marotta V. ; Orlando S. (2006)
  Multilayered metal oxide thin film gas sensors obtained by conventional and RF plasma-assisted laser ablation
  in Applied surface science
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• Mitu B. ; Marotta V. ; Orlando S. (literal)

Pagina inizio

• 4637 (literal)

Pagina fine

• 4641 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url

• http://www.sciencedirect.com/science/article/pii/S0169433205014273 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 252 (literal)

Rivista

• Applied surface science (Rivista)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali

• 5 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo

• 13 (literal)

Note

• ISI Web of Science (WOS) (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• National Institute for Lasers, Plasma and Radiation Physics, P.O. Box MG 36 Magurele, Bucharest 77125, Romania; CNR -IMIP Sezione di Potenza, Tito Scalo (PZ) 85050 Italy (literal)

Titolo

• Multilayered metal oxide thin film gas sensors obtained by conventional and RF plasma-assisted laser ablation (literal)

Abstract

• Multilayered thin films of In2O3 and SnO2 have been deposited by conventional and RIF plasma-assisted reactive pulsed laser ablation. with the aim to evaluate their behaviour as toxic gas sensors. The depositions have been carried out by a frequency doubled Nd-YAG laser (lambda = 532 nm. tau = 7 ns) on Si(1 0 0) substrates, in O-2 atmosphere. The thin films have been characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and electrical resistance measurements. A comparison of the electrical response of the simple (indium oxide, tin oxide) and multilayered oxides to toxic gas (nitric oxide, NO) has been performed. The influence on the structural and electrical properties of the deposition parameters, such as substrate temperature and RF power is reported. (literal)

Prodotto di

• Istituto di Nanotecnologia (NANOTEC) (Istituto)
• Interazione Laser Materia (MD.P03.030.001) (Modulo)

Autore CNR

• STEFANO ORLANDO (Unità di personale interno)
• IDA VERONICA MAROTTA (Persona)

Insieme di parole chiave

• Keywords of "Multilayered metal oxide thin film gas sensors obtained by conventional and RF plasma-assisted laser ablation" (Insieme di parole chiave)

Incoming links:

Prodotto

• Istituto di Nanotecnologia (NANOTEC) (Istituto)
• Interazione Laser Materia (MD.P03.030.001) (Modulo)

Autore CNR di

• IDA VERONICA MAROTTA (Persona)
• STEFANO ORLANDO (Unità di personale interno)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Applied surface science (Rivista)

Insieme di parole chiave di

• Keywords of "Multilayered metal oxide thin film gas sensors obtained by conventional and RF plasma-assisted laser ablation" (Insieme di parole chiave)