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Dielectric function of Nanocrystalline Silicon with Few Nanometers (<3nm) grain size (Articolo in rivista)
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- Dielectric function of Nanocrystalline Silicon with Few Nanometers (<3nm) grain size (Articolo in rivista) (literal)
- Anno
- 2003-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1063/1.1569052 (literal)
- Alternative label
M. Losurdo, M.M. Giangregorio, P. Capezzuto, G. Bruno, M.F. Cerqueira, M. Stepikova (2003)
Dielectric function of Nanocrystalline Silicon with Few Nanometers (<3nm) grain size
in Applied physics letters
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- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- M. Losurdo, M.M. Giangregorio, P. Capezzuto, G. Bruno, M.F. Cerqueira, M. Stepikova (literal)
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- It bring together expertise from optical analysis and deposition of Si (IMIP-CNR, Italy), Er co-sputtering (M.F. Cerqueira @ Departamanto de Fisica, Universidade do Minho, Braga, Porugal) and from photoluminescence (M. Stepikova @ Institute for physics of Microstructures RAS Novgorod, Russia)
IMPACT FACTOR=4.207 (literal)
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- This paper focuses on the growth and the nanometrology of nanocrystalline silicon films (nc-Si:H). These subjects are very important to Si-based optoelectronics because nc-Si in a-Si:H and SiO2 matrixes are essential for the direct VIS luminescence of silicon and for the near-IR luminescence from Er-doped materials. This paper proposes an innovative optical non destructive procedure for detection of nanocrystallites. (literal)
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- ISI Web of Science (WOS) (literal)
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- (1)IMIP-CNR, sez. Bari
(2)Dept of Physics Univ. do Minho, Braga, Portugal
(3)Institute of Physics, Novgorod, Russia (literal)
- Titolo
- Dielectric function of Nanocrystalline Silicon with Few Nanometers (<3nm) grain size (literal)
- Abstract
- The dielectric function of nanocrystalline silicon ~nc-Si! with crystallite size in the range of 1 to 3 nm has been determined by spectroscopic ellipsometry in the range of 1.5 to 5.5 eV. ATaucLorentz parameterization is used to model the nc-Si optical properties. The nc-Si dielectric function can be used to analyze nondestructively nc-Si thin films where nanocrystallites that cannot be detected by conventional structural techniques, such as x-ray diffraction and Raman spectroscopy, are embedded in an a-Si:H matrix. Ellipsometric results are corroborated by transmission electron microscopy measurements. © 2003 American Institute of Physics. @DOI: 10.1063/1.1569052# (literal)
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