http://www.cnr.it/ontology/cnr/individuo/prodotto/ID32814
A comparative study of the morphology of 3C-SiC grown at different C/Si ratios (Articolo in rivista)
- Type
- Label
- A comparative study of the morphology of 3C-SiC grown at different C/Si ratios (Articolo in rivista) (literal)
- Anno
- 2009-01-01T00:00:00+01:00 (literal)
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- Attolini G.; Watts B. E.; Bosi M.; Rossi F.; Riesz F. (literal)
- Pagina inizio
- Pagina fine
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
- Rivista
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- In: Materials Science Forum, vol. 615-617 pp. 153 - 156. Trans Tech Publications, 2009. (literal)
- Note
- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- CNR-IMEM, Parma, Research Institute for Technical Physics and Materials Science, Hungarian Academy (literal)
- Titolo
- A comparative study of the morphology of 3C-SiC grown at different C/Si ratios (literal)
- Abstract
- A comparative study of the morphology of 3C-SiC films prepared with different C:Si ratios is presented. The silane precursor controls the growth rate at all values of C:Si ratio but combined of observations using Atomic Force Microscopy (AFM) and Scanning Electron Microscopy (SEM) indicates that the C:Si ratio is critical in determining the grain size and at values of C:Si close to 1 texturing and faceting become evident. Makyoh Topography reveals various surface defects, a slight mesoscale roughness and bending of the epiwafers. (literal)
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