http://www.cnr.it/ontology/cnr/individuo/prodotto/ID32431
Conducting In-doped CdTe oxide thin films grown by pulsed-laser deposition (Articolo in rivista)
- Type
- Label
- Conducting In-doped CdTe oxide thin films grown by pulsed-laser deposition (Articolo in rivista) (literal)
- Anno
- 2005-01-01T00:00:00+01:00 (literal)
- Alternative label
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Castro Rodríguez R.; Peña J.L.; Leccabue F.; Watts B.E.; and Melioli E. (literal)
- Pagina inizio
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
- Rivista
- Note
- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- Istituto dei materiali per l'elettronica ed il magnetismo (literal)
- Titolo
- Conducting In-doped CdTe oxide thin films grown by pulsed-laser deposition (literal)
- Abstract
- Conducting transparent oxide semiconductor In-doped CdTe oxide (ICTO) thin films (similar to 200 nm thick) have been deposited by pulsed-laser deposition on glass substrates without a postdeposition anneal. The electrical, structural, and optical properties of these films have been investigated as a function of O-2 partial pressures during the deposition. Films were deposited at substrate temperature of 420 degrees C in oxygen partial pressures between 15 and 55 mTorr. The resistivity is very sensitive to the oxygen deposition pressure; at 28.5 mTorr the films show electrical resistivities as low as 9.4x10(-3) Omega cm, an average visible transmittance of similar to 75.5%, and an optical band gap of 2.74 eV. (c) 2005 American Institute of Physics. (literal)
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- Autore CNR
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