Conducting In-doped CdTe oxide thin films grown by pulsed-laser deposition (Articolo in rivista)

Type
Label
  • Conducting In-doped CdTe oxide thin films grown by pulsed-laser deposition (Articolo in rivista) (literal)
Anno
  • 2005-01-01T00:00:00+01:00 (literal)
Alternative label
  • Castro Rodríguez R.; Peña J.L.; Leccabue F.; Watts B.E.; and Melioli E. (2005)
    Conducting In-doped CdTe oxide thin films grown by pulsed-laser deposition
    in Applied physics letters
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Castro Rodríguez R.; Peña J.L.; Leccabue F.; Watts B.E.; and Melioli E. (literal)
Pagina inizio
  • 061916 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 87 (literal)
Rivista
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • Istituto dei materiali per l'elettronica ed il magnetismo (literal)
Titolo
  • Conducting In-doped CdTe oxide thin films grown by pulsed-laser deposition (literal)
Abstract
  • Conducting transparent oxide semiconductor In-doped CdTe oxide (ICTO) thin films (similar to 200 nm thick) have been deposited by pulsed-laser deposition on glass substrates without a postdeposition anneal. The electrical, structural, and optical properties of these films have been investigated as a function of O-2 partial pressures during the deposition. Films were deposited at substrate temperature of 420 degrees C in oxygen partial pressures between 15 and 55 mTorr. The resistivity is very sensitive to the oxygen deposition pressure; at 28.5 mTorr the films show electrical resistivities as low as 9.4x10(-3) Omega cm, an average visible transmittance of similar to 75.5%, and an optical band gap of 2.74 eV. (c) 2005 American Institute of Physics. (literal)
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