Fabrication of multiple large arrays of split ring resonators by X-ray lithographic process for sensing purposes (Articolo in rivista)

Type

• Articolo in rivista (Classe)
• Prodotto della ricerca (Classe)

Label

• Fabrication of multiple large arrays of split ring resonators by X-ray lithographic process for sensing purposes (Articolo in rivista) (literal)

Anno

• 2014-01-01T00:00:00+01:00 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi

• 10.1016/j.mee.2014.04.030 (literal)

Alternative label

• Giorgis, V.; Zilio, P.; Massari, M.; Ruffato, G.; Zacco, G.; Romanato, F. (2014)
  Fabrication of multiple large arrays of split ring resonators by X-ray lithographic process for sensing purposes
  in Microelectronic engineering
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• Giorgis, V.; Zilio, P.; Massari, M.; Ruffato, G.; Zacco, G.; Romanato, F. (literal)

Pagina inizio

• 68 (literal)

Pagina fine

• 71 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 127 (literal)

Rivista

• Microelectronic engineering (Rivista)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali

• 4 (literal)

Note

• ISI Web of Science (WOS) (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• CNR IOM; LaNN (literal)

Titolo

• Fabrication of multiple large arrays of split ring resonators by X-ray lithographic process for sensing purposes (literal)

Abstract

• In this paper we present the fabrication of multiple, large arrays of nano-metric split ring resonators, having variable aspect ratio, in order to obtain a sample suitable for prism-free plasmonic sensing applications. It has been shown that high aspect ratio structures present a richer longitudinal plasmonic resonant response, compared to thin geometries. In order to produce a platform suitable also for parallel measurements, the split ring resonators were arranged in ten square arrays, having an area of 1 x 1 mm, over a surface area of 12 x 18 mm. To obtain this result, we developed a fabrication process based on X-ray lithography. The choice of X-ray lithography as the main technique is justified by the possibility to obtain higher aspect ratio and to achieve large areas arrays of nano-structures in a single, fast exposure, compared to other techniques, such as Nanoimprint Lithography or Electron Beam Lithography. A new X-ray mask design was developed for achieving the ten large chips design. The fabricated split ring resonator arrays have been characterized by ellipsometric transmittance measurements in the visible and near-infrared range. The strong dependence of the split ring resonant response to the polarization of the impinging light, has been exploited to perform a test of the detection properties of the structure, functionalized with a mono-layer of self assembled dodecanethiols. The encouraging results of the detection test indicate the SRR geometry as a promising sensing structure. (C) 2014 Elsevier B.V. All rights reserved. (literal)

Prodotto di

• MD.P06.017.001 Nanofabbricazione (MD.P06.017.005) (Modulo)

Autore CNR

• FILIPPO ROMANATO (Unità di personale interno)
• VALENTINA GIORGIS (Persona)
• GABRIELE ZACCO (Unità di personale esterno)

Insieme di parole chiave

• Keywords of "Fabrication of multiple large arrays of split ring resonators by X-ray lithographic process for sensing purposes" (Insieme di parole chiave)

Incoming links:

Autore CNR di

• FILIPPO ROMANATO (Unità di personale interno)
• VALENTINA GIORGIS (Persona)
• GABRIELE ZACCO (Unità di personale esterno)

Prodotto

• MD.P06.017.001 Nanofabbricazione (MD.P06.017.005) (Modulo)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Microelectronic engineering (Rivista)

Insieme di parole chiave di

• Keywords of "Fabrication of multiple large arrays of split ring resonators by X-ray lithographic process for sensing purposes" (Insieme di parole chiave)