http://www.cnr.it/ontology/cnr/individuo/prodotto/ID312876
Synthesis and light absorption mechanism in Si or Ge nanoclusters for photovoltaics applications (Articolo in rivista)
- Type
- Label
- Synthesis and light absorption mechanism in Si or Ge nanoclusters for photovoltaics applications (Articolo in rivista) (literal)
- Anno
- 2014-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.4028/www.scientific.net/SSP.205-206.465 (literal)
- Alternative label
Mirabella S.; Cosentino S.; Terrasi A. (2014)
Synthesis and light absorption mechanism in Si or Ge nanoclusters for photovoltaics applications
in Diffusion and defect data, solid state data. Part B, Solid state phenomena
(literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Mirabella S.; Cosentino S.; Terrasi A. (literal)
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- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url
- http://www.scopus.com/inward/record.url?eid=2-s2.0-84886779724&partnerID=q2rCbXpz (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
- Rivista
- Note
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- CNR-IMM MATIS, Via S. Sofia 64, 95123 Catania, Italy; Università di Catania, Dipartimento Fisica e Astronomia, Via S. Sofia 64, 95123 Catania, Italy (literal)
- Titolo
- Synthesis and light absorption mechanism in Si or Ge nanoclusters for photovoltaics applications (literal)
- Abstract
- Photon absorption in the solar energy range has been investigated in semiconductor
nanostructures. Different synthesis techniques (magnetron sputtering, plasma enhanced chemical
vapor deposition, ion implantation) followed by thermal annealing, have been employed to fabricate
Si or Ge nanoclusters (1-25 nm in size) embedded in SiO2 or Si3N4 matrices. The thermal evolution
in the formation of Si nanoclusters (NCs) in SiO2 was shown to depend on the synthesis technique
and to significantly affect the light absorption. Experimentally measured values of optical bandgap
(Eg
OPT) in Si NCs evidence the quantum confinement effect which significantly increases the value
of Eg
OPT in comparison to bulk Si. Eg
OPT spans over a large range (1.6-2.6 eV) depending on the Si
content, on the deposition technique and, in a most significant way, on the structural phase of NC.
Amorphous Si NCs have a lower Eg
OPT in comparison to crystalline ones. The matrix effect on the
synthesis and light absorption in semiconductor NCs was investigated for Ge NCs. Large difference
in the Ge NCs synthesis occurred when using SiO2 or Si3N4 matrices, essentially due to a much
lower Ge diffusivity in the latter, which slows down the formation and growth of Ge NCs in
comparison to silica matrix. Light absorption in NCs is also shown to be largely affected by the host
matrix. Actually, Ge NCs embedded in Si3N4 material absorb photons in the solar energy range with
a higher efficiency than in silica, due to the different confinement effect. In fact, Si3N4 host offers a
lower potential barrier to photogenerated carriers in comparison to silica, thus a lower confinement
effect is expected, leading to slightly smaller optical bandgap. These effects have been presented
and discussed for potential application in light harvesting purposes. (literal)
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