http://www.cnr.it/ontology/cnr/individuo/prodotto/ID291225

Holographic patterning of graphene-oxide films by light-driven reduction (Articolo in rivista)

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Holographic patterning of graphene-oxide films by light-driven reduction (Articolo in rivista) (literal)

Anno

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Alternative label

Orabona E.; Ambrosio A.; Longo A.; Carotenuto G.; Nicolais L.; Maddalena P. (2014)
Holographic patterning of graphene-oxide films by light-driven reduction
in Optics letters
(literal)

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Orabona E.; Ambrosio A.; Longo A.; Carotenuto G.; Nicolais L.; Maddalena P. (literal)

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Note

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Dipartimento di Fisica, Università Degli Studi di Napoli Federico II, Complesso Universitario di Monte Sant'Angelo, Via Cintia, 80126 Napoli, Italy; CNR-SPIN, U.O.S. Napoli, Complesso Universitario di Monte Sant'Angelo, Via Cintia, 80126 Napoli, Italy; School of Engineering and Applied Sciences, Harvard University, 9 Oxford Street, Cambridge, MA, 02138, United States; Institute for Composite and Biomedical Materials, National Research Council, 80055 Portici (NA), Italy (literal)

Titolo

Holographic patterning of graphene-oxide films by light-driven reduction (literal)

Abstract

We report on the patterning and reduction of graphene-oxide films by holographic lithography. Light reduction can be used to engineer low-cost graphene-based devices by performing a local conversion of insulating oxide into the conductive graphene. In this work, computer-generated holograms have been exploited to realize complex graphene patterns in a single shot, different from serial laser writing or mask-based photolithographic processes. The technique has been further improved by achieving speckle noise reduction: submicron and diffraction-limited features have been obtained. In addition we have also demonstrated that the gray-scale lithography capability can be used to obtain different reduction levels in a single exposure. © 2014 Optical Society of America. (literal)

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