Pulsed Electron Deposition (PED) of Single Buffer Layer for low-cost YBCO Coated Conductors (Articolo in rivista)

Type
Label
  • Pulsed Electron Deposition (PED) of Single Buffer Layer for low-cost YBCO Coated Conductors (Articolo in rivista) (literal)
Anno
  • 2008-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1088/1742-6596/97/1/012197 (literal)
Alternative label
  • E Gilioli1 , M Baldini2, M Bindi2, F Bissoli1, D Calestani1, F Pattini1, S Rampino1, M Rocca3, S Zannella2 and R Woerdenweber4 (2008)
    Pulsed Electron Deposition (PED) of Single Buffer Layer for low-cost YBCO Coated Conductors
    in Journal of Physics: Conference Series; IOP Publishing Ltd. (Institute of Physics Publishing Ltd), "Bristol ; London" (Regno Unito)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • E Gilioli1 , M Baldini2, M Bindi2, F Bissoli1, D Calestani1, F Pattini1, S Rampino1, M Rocca3, S Zannella2 and R Woerdenweber4 (literal)
Pagina inizio
  • 012197-1 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 97 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali
  • 6 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • 1 IMEM-CNR, Area delle Scienze 7/A, 43100 Parma, Italy 2 Edison S.p.A., Foro Buonaparte 31, 20121 Milan, Italy 3 IMEM-CNR and DIFI-University of Genoa, Via Dodecaneso 33, 16146 Genoa, Italy 4 Forschungszentrum Jülich GmbH, Leo-Brandt-Strasse, D-52425 Jülich, Germany (literal)
Titolo
  • Pulsed Electron Deposition (PED) of Single Buffer Layer for low-cost YBCO Coated Conductors (literal)
Abstract
  • The challenge for the commercialization of YBCO Coated Conductors (CC) is the development of a low cost manufacturing process to allow for a cheap, fast and continuous deposition of superconducting coatings with high electrical performance. We are currently investigating 2 ways to reduce the CC production costs: i) reducing the complexity of the CC architecture, by growing a single buffer layer based on doped CeO2, and ii) utilizing a new reel-to-reel apparatus for long length CC processing, equipped with a cheap and reliable deposition system (PED, Pulsed Electron Deposition). In this work we report on the successful continuous deposition of very thick (up to 700 nm) doped-CeO2 single buffer layers on biaxially textured Ni-5at%W substrates by PED. XRD patterns display complete orientation and very good texture quality of our samples (FWHM out-of plane values of ? 6°), over 20 cm length. Optical and electron microscopy show a dense and crack-free film surface and dielectric strength measurement confirms excellent insulating properties. Preliminary results indicate that the simplified single buffer layer structure could be a reliable solution for the reduction of HTS CC production costs. (literal)
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