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Review on Atomic Layer Deposition and Applications of Oxide Thin Films (Articolo in rivista)

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Review on Atomic Layer Deposition and Applications of Oxide Thin Films (Articolo in rivista) (literal)

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Alternative label

Ponraj, Joice Sophia; Attolini, Giovanni; Bosi, Matteo (2013)
Review on Atomic Layer Deposition and Applications of Oxide Thin Films
in Critical reviews in solid state and materials sciences; TAYLOR & FRANCIS INC, PHILADELPHIA, PA (Stati Uniti d'America)
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1 IMEM CNR, Ist Mat Elettron & Magnetismo, I-43124 Parma, Italy; 2 Anna Univ, Ctr Crystal Growth, Madras 600025, Tamil Nadu, India (literal)

Titolo

Review on Atomic Layer Deposition and Applications of Oxide Thin Films (literal)

Abstract

Atomic layer deposition technique is able to grow conformal thin films over high aspect ratio structures. This article reviews the various aspects of oxides grown by this method including applications in photovoltaics and memristors. The main focus of this review is to concentrate on the oxides grown by atomic layer deposition and their growth mechanisms. The oxides deposited using atomic layer deposition are also likely to find application in memristor, an emerging field in the non volatile memories design with the ability to retain data and memory states even in power-off condition. The use of this technique to obtain oxides in surface modification of nanostructures gives the significance of these materials. (literal)

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