Non-Conventional Characterization of Electrically Active Dopant Profiles in Al-Implanted Ge by Depth-Resolved Micro-Raman Spectroscopy (Articolo in rivista)

Type
Label
  • Non-Conventional Characterization of Electrically Active Dopant Profiles in Al-Implanted Ge by Depth-Resolved Micro-Raman Spectroscopy (Articolo in rivista) (literal)
Anno
  • 2013-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.7567/APEX.6.042404 (literal)
Alternative label
  • Sanson A, Napolitani E, Giarola M, Impellizzeri G, Privitera V, Mariotto G,, Carnera A (2013)
    Non-Conventional Characterization of Electrically Active Dopant Profiles in Al-Implanted Ge by Depth-Resolved Micro-Raman Spectroscopy
    in Applied physics express
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Sanson A, Napolitani E, Giarola M, Impellizzeri G, Privitera V, Mariotto G,, Carnera A (literal)
Pagina inizio
  • 042404 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 6 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
  • 4 (literal)
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • [ 1 ] Univ Padua, Dipartimento Fis & Astron, I-35131 Padua, Italy [ 2 ] Univ Padua, CNR IMM MATIS, Dipartimento Fis & Astron, I-35131 Padua, Italy [ 3 ] Univ Verona, Dipartimento Informat, I-37134 Verona, Italy [ 4 ] Univ Catania, CNR IMM MATIS, Dipartimento Fis & Astron, I-95123 Catania, Italy (literal)
Titolo
  • Non-Conventional Characterization of Electrically Active Dopant Profiles in Al-Implanted Ge by Depth-Resolved Micro-Raman Spectroscopy (literal)
Abstract
  • Al-implanted Ge samples were investigated by micro-Raman spectroscopy combined with a small angle beveling technique. By means of a reverse Monte Carlo procedure, the concentration profiles of the electrically active dopant ions were determined from the Raman peak observed at similar to 370 cm(-1) related to substitutional Al atoms. Furthermore, a clear relationship between the Ge-Ge Raman peak at similar to 300 cm(-1) and the active dopant concentration was also observed. This work shows that micro-Raman spectroscopy could be adopted for quantitative characterizations of the carrier concentration profiles in extrinsic semiconductors. (literal)
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