Electrical and structural properties of AIGaN/GaN heterostructures grown onto 8° -off-axis 4H-SiC epilayers (Articolo in rivista)

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  • Electrical and structural properties of AIGaN/GaN heterostructures grown onto 8° -off-axis 4H-SiC epilayers (Articolo in rivista) (literal)
Anno
  • 2011-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.4028/www.scientific.net/MSF.679-680.808 (literal)
Alternative label
  • Roccaforte, F. and Greco, G. and Weng, M.H. and Giannazzo, F. and Raineri, V. (2011)
    Electrical and structural properties of AIGaN/GaN heterostructures grown onto 8° -off-axis 4H-SiC epilayers
    in Materials science forum
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Roccaforte, F. and Greco, G. and Weng, M.H. and Giannazzo, F. and Raineri, V. (literal)
Pagina inizio
  • 808 (literal)
Pagina fine
  • 811 (literal)
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  • cited By (since 1996)0; Conference of org.apache.xalan.xsltc.dom.DOMAdapter@6eac823f ; Conference Date: org.apache.xalan.xsltc.dom.DOMAdapter@7f9b2edc Through org.apache.xalan.xsltc.dom.DOMAdapter@2521aef7; Conference Code:84545 (literal)
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  • http://www.scopus.com/inward/record.url?eid=2-s2.0-79955115987&partnerID=40&md5=34da357f66afe20270467ab191ccd9ab (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 679-680 (literal)
Rivista
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  • Scopu (literal)
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  • Consiglio Nazionale Delle Ricerche, Istituto Per la Microelettronica e Microsistemi, Strada VIII n.5, Zona Industriale, 95121, Catania, Italy (literal)
Titolo
  • Electrical and structural properties of AIGaN/GaN heterostructures grown onto 8° -off-axis 4H-SiC epilayers (literal)
Abstract
  • In this work the electrical and structural properties of AlGaN/GaN heterostructures grown onto 8° -off-axis 4H-SiC epilayers were investigated. A morphological and structural analysis of the samples showed the presence of \"V-shaped\" near-surface defects in the AlGaN layer, with a preferential orientation along the miscut direction [11-20]. In the presence of these defects an anisotropy of the current-voltage characteristics of high electron mobility transistors (HEMTs), fabricated with two different orientations, was observed. The sheet carrier density n s and the channel mobility ? n were determined from the device characteristics. The results were discussed considering the possible implications for AlGaN/GaN HEMT technology. (c) (2011) Trans Tech Publications. (literal)
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