Interfacial and bulk electronic properties of complex oxides and buried interfaces probed by HAXPES (Articolo in rivista)

Type
Label
  • Interfacial and bulk electronic properties of complex oxides and buried interfaces probed by HAXPES (Articolo in rivista) (literal)
Anno
  • 2013-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1016/j.elspec.2013.01.002 (literal)
Alternative label
  • F. Borgatti (1), F. Offi (2), P. Torelli (3), G. Monaco (4), G. Panaccione (3) (2013)
    Interfacial and bulk electronic properties of complex oxides and buried interfaces probed by HAXPES
    in Journal of electron spectroscopy and related phenomena (Print); Elsevier, Amsterdam (Paesi Bassi)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • F. Borgatti (1), F. Offi (2), P. Torelli (3), G. Monaco (4), G. Panaccione (3) (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • (1) CNR - Istituto per lo Studio dei Materiali Nanostrutturati (ISMN),Via Piero Gobetti 101, 40129 Bologna, Italy ; (2) CNISM and Dipartimento di Fisica, Università Roma Tre, Via della Vasca Navale 84, I-00146 Rome, Italy ; (3) CNR, Istituto Officina dei Materiali (IOM), Lab. TASC, in Area Science Park, S.S. 14 km 163.5, I-34149 Trieste, Italy ; (4) European Synchrotron Radiation Facility, BP 220, 38043 Grenoble, France (literal)
Titolo
  • Interfacial and bulk electronic properties of complex oxides and buried interfaces probed by HAXPES (literal)
Abstract
  • Designing, understanding and controlling the properties of engineered and functional materials, based on oxides and buried interfaces, is one of the most flourishing research fields and one of the major challenges faced by contemporary solid state science and technology. Often, a reliable spectroscopic analysis of such systems is hindered by surface effects, as structural distortion, stoichiometry changes, strong reactivity to external agent and major atomic and/or electronic reconstruction to name but a few. Hard X-Ray PhotoEmission Spectroscopy (HAXPES) is a powerful technique to overcome such limitations, allowing to monitor truly bulk sensitive properties. We report selected HAXPES results for manganesebased oxides, both in films and crystal forms, and for buried metal-organic interfaces, with the aim of highlighting some of the important features such technique brings in the analysis of electronic properties of the solids. (literal)
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