Oxygen background gas influence on pulsed laser deposition process of LaAlO3 and LaGaO3 (Articolo in rivista)

Type
Label
  • Oxygen background gas influence on pulsed laser deposition process of LaAlO3 and LaGaO3 (Articolo in rivista) (literal)
Anno
  • 2012-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1016/j.apsusc.2011.09.078 (literal)
Alternative label
  • Amoruso, S. and Aruta, C. and Aurino, P. and Bruzzese, R. and Wang, X. and Granozio, F.M. and Scotti Di Uccio, U. (2012)
    Oxygen background gas influence on pulsed laser deposition process of LaAlO3 and LaGaO3
    in Applied surface science
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Amoruso, S. and Aruta, C. and Aurino, P. and Bruzzese, R. and Wang, X. and Granozio, F.M. and Scotti Di Uccio, U. (literal)
Pagina inizio
  • 9116 (literal)
Pagina fine
  • 9122 (literal)
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  • cited By (since 1996)4 (literal)
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  • http://www.scopus.com/inward/record.url?eid=2-s2.0-84864423051&partnerID=40&md5=2a44c8d5c46b14642f1bb2d2ec891a24 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 258 (literal)
Rivista
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  • 23 (literal)
Note
  • Scopu (literal)
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  • Dipartimento di Scienze Fisiche, Università degli Studi di Napoli Federico II, Complesso Universitario di Monte S. Angelo, Via Cintia, I-80126 Napoli, Italy CNR-SPIN, Complesso Universitario di Monte S. Angelo, Via Cintia, I-80126 Napoli, Italy (literal)
Titolo
  • Oxygen background gas influence on pulsed laser deposition process of LaAlO3 and LaGaO3 (literal)
Abstract
  • We investigate pulsed laser ablation of LaAlO3 and LaGaO3 with a focus on the influence of oxygen background gas pressure on the plume expansion dynamics and deposition rate. The ablation plume is characterized by exploiting fast photography and time-and space-resolved optical emission spectroscopy. The variation of the deposition rate with the oxygen background pressure was obtained at 800 degrees C by reflection high-energy electron diffraction, and compared to that measured at room temperature by means of a quartz crystal microbalance. The experimental findings allow one to address the various stages of plume expansion as a function of the background oxygen pressure as well as the changes induced on the plume species kinetic energy and composition. On the base of our experimental results, the possible influence of various mechanisms, such as subplantation and oxygen vacancy formation, on the growth of oxides interfaces is addressed. (literal)
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