Electron density control using fast gas puffing in reversed-field pinch device, TPE-RX (Articolo in rivista)

Type
Label
  • Electron density control using fast gas puffing in reversed-field pinch device, TPE-RX (Articolo in rivista) (literal)
Anno
  • 2004-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1143/JJAP.43.L1184 (literal)
Alternative label
  • Sakakita H., Y. Yagi, H. Koguchi, Y. Hirano, T. Shimada, A. Canton, P. Innocente (2004)
    Electron density control using fast gas puffing in reversed-field pinch device, TPE-RX
    in Japanese journal of applied physics
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Sakakita H., Y. Yagi, H. Koguchi, Y. Hirano, T. Shimada, A. Canton, P. Innocente (literal)
Pagina inizio
  • L1184 (literal)
Pagina fine
  • L1186 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url
  • http://jjap.jsap.jp/link?JJAP/43/L1184/ (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 43 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali
  • 3 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
  • 9A-B (literal)
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • 1 National Institute of Advanced Industrial Science and Technology, Tsukuba, Japan; 2 Consorzio RFX, Padua, Italy; (Sakakita H. 1, Y. Yagi 1, H. Koguchi 1, Y. Hirano 1, T. Shimada 1, A. Canton 2, P. Innocente 2) (literal)
Titolo
  • Electron density control using fast gas puffing in reversed-field pinch device, TPE-RX (literal)
Abstract
  • Electron density is scanned using fast gas puffing in the reversed-field pinch (RFP) device, TPE-RX. The gas puffing technique extends the operating range of IP/N from 12 to 2 ×10-14 Am (IP and N denote the plasma current and line density, respectively). It is estimated that the poloidal beta, ?P, increases as IP/N decreases. This ?P scaling with IP/N in TPE-RX confirms a similar tendency previously obtained in other RFP plasmas. The radiation fraction increases from ~20% in the low-density regime to ~35% in the highest-density regime. This result indicates that the lowest IP/N limit in RFP is similar to the density limit in tokamak plasmas. (literal)
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