Stress-assisted two-way memory effect electrically driven in 50at.%Ti-45 at. %Ni-5 at. %Cu alloy (Articolo in rivista)

Type
Label
  • Stress-assisted two-way memory effect electrically driven in 50at.%Ti-45 at. %Ni-5 at. %Cu alloy (Articolo in rivista) (literal)
Anno
  • 2006-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1016/j.msea.2006.02.096 (literal)
Alternative label
  • Gariboldi, F (1) ; Besseghini, S (2) ; Airoldi, G (1) (2006)
    Stress-assisted two-way memory effect electrically driven in 50at.%Ti-45 at. %Ni-5 at. %Cu alloy
    in Materials science & engineering. A, Structural materials: properties, microstructure and processing; ELSEVIER SCIENCE, Losanna (Svizzera)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Gariboldi, F (1) ; Besseghini, S (2) ; Airoldi, G (1) (literal)
Pagina inizio
  • 653 (literal)
Pagina fine
  • 656 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 438 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali
  • 3 (literal)
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • [ 1 ] Univ Milano Bicocca, Dipartimento Sci Mat, I-20125 Milan, Italy [ 2 ] CNR, IENI, I-23900 Lecce, Italy (literal)
Titolo
  • Stress-assisted two-way memory effect electrically driven in 50at.%Ti-45 at. %Ni-5 at. %Cu alloy (literal)
Abstract
  • Electrical resistance (R) and deformation (epsilon) are studied in Ti-45 at.%Ni-5 at.%Cu alloy, electrically driven through the transformation range under different constant stress levels in the range 10-500 MPa. Specimens with increasing preliminary cold-work levels (13, 19, 28 and 45%) were selected, in order to single out the condition sigma(crss) (critical resolved shear stress) > sigma(a) (applied stress). In the following, attention is focussed on specimens with 45% cold work, which were submitted to 1000 cycles under constant stress levels of 50, 75 and 100 MPa. A linear relationship between electrical resistance change and strain was obtained under all such conditions, with no accumulated residual strain, for an applied stress of 50 MPa. For the higher stress levels investigated, a small decreasing residual strain appears during the first 500 cycles, which then levels off for a greater number of cycles. (literal)
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