Hybrid chemical etching of femtosecond laser irradiated structures for engineered microfluidic devices (Articolo in rivista)

Type

• Prodotto della ricerca (Classe)
• Articolo in rivista (Classe)

Label

• Hybrid chemical etching of femtosecond laser irradiated structures for engineered microfluidic devices (Articolo in rivista) (literal)

Anno

• 2013-01-01T00:00:00+01:00 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi

• 10.1088/0960-1317/23/8/085002 (literal)

Alternative label

• LoTurco, S. and Osellame, R. and Ramponi, R. and Vishnubhatla, K. C. (2013)
  Hybrid chemical etching of femtosecond laser irradiated structures for engineered microfluidic devices
  in Journal of micromechanics and microengineering (Print)
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• LoTurco, S. and Osellame, R. and Ramponi, R. and Vishnubhatla, K. C. (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 23 (literal)

Rivista

• Journal of micromechanics and microengineering (Rivista)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo

• 8 (literal)

Note

• ISI Web of Science (WOS) (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• LoTurco, S (Reprint Author), Ist Italiano Tecnol, Ctr Nano Sci & Technol PoliMi, Via Giovanni Pascoli 70-3, I-20133 Milan, Italy. LoTurco, S.; Ramponi, R.; Vishnubhatla, K. C., Ist Italiano Tecnol, Ctr Nano Sci & Technol PoliMi, I-20133 Milan, Italy. LoTurco, S.; Ramponi, R., Politecn Milan, Dipartimento Fis, I-20133 Milan, Italy. Osellame, R.; Ramponi, R., Ist Foton & Nanotecnol CNR, I-20133 Milan, Italy. (literal)

Titolo

• Hybrid chemical etching of femtosecond laser irradiated structures for engineered microfluidic devices (literal)

Abstract

• We report on the fabrication of 3D buried micro-structures in fused silica glass using the selective chemical etching along femtosecond laser irradiated zones. Specifically, we have exploited a novel approach combining two different etching agents in successive steps. The widely used hydrofluoric acid solution, which provides fast volume removal, and potassium hydroxide solution, which exhibits high selectivity, are used to fabricate microfluidic structures. We demonstrate that this hybrid approach takes advantage of both of the individual etchants' special characteristics and facilitates prototyping and fabrication of complex geometries for microfluidic devices. (literal)

Prodotto di

• Istituto di fotonica e nanotecnologie (IFN) (Istituto)

Autore CNR

• ROBERTA RAMPONI (Unità di personale interno)
• ROBERTO OSELLAME (Unità di personale interno)

Insieme di parole chiave

• Parole chiave di "Hybrid chemical etching of femtosecond laser irradiated structures for engineered microfluidic devices" (Insieme di parole chiave)

Incoming links:

Autore CNR di

• ROBERTO OSELLAME (Unità di personale interno)
• ROBERTA RAMPONI (Unità di personale interno)

Prodotto

• Istituto di fotonica e nanotecnologie (IFN) (Istituto)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Journal of micromechanics and microengineering (Rivista)

Insieme di parole chiave di

• Parole chiave di "Hybrid chemical etching of femtosecond laser irradiated structures for engineered microfluidic devices" (Insieme di parole chiave)