Scaling of black silicon processing time by high repetition rate femtosecond lasers (Articolo in rivista)

Type
Label
  • Scaling of black silicon processing time by high repetition rate femtosecond lasers (Articolo in rivista) (literal)
Anno
  • 2013-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1364/OME.3.000612 (literal)
Alternative label
  • Nava, Giorgio and Osellame, Roberto and Ramponi, Roberta and Vishnubhatla, Krishna Chaitanya (2013)
    Scaling of black silicon processing time by high repetition rate femtosecond lasers
    in Optical materials express
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Nava, Giorgio and Osellame, Roberto and Ramponi, Roberta and Vishnubhatla, Krishna Chaitanya (literal)
Pagina inizio
  • 612 (literal)
Pagina fine
  • 623 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 3 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
  • 5 (literal)
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • Nava, G (Reprint Author), Ist Italiano Tecnol, Ctr Nano Sci & Technol PoliMi, Via Giovanni Pascoli 70-3, I-20133 Milan, Italy. Nava, Giorgio; Ramponi, Roberta; Vishnubhatla, Krishna Chaitanya, Ist Italiano Tecnol, Ctr Nano Sci & Technol PoliMi, I-20133 Milan, Italy. Nava, Giorgio; Ramponi, Roberta, Politecn Milan, Dipartimento Fis, I-20133 Milan, Italy. Osellame, Roberto; Ramponi, Roberta, CNR, Ist Foton & Nanotecnol, I-20133 Milan, Italy. (literal)
Titolo
  • Scaling of black silicon processing time by high repetition rate femtosecond lasers (literal)
Abstract
  • Surface texturing of silicon substrates is performed by femtosecond laser irradiation at high repetition rates. Various fabrication parameters are optimized, in order to achieve very high absorptance in the visible region from the micro-structured silicon wafers as compared to the unstructured ones. A 35-fold reduction of the processing time is demonstrated by increasing the laser repetition rate from 1 kHz to 200 kHz. Further scaling up to 1 MHz is proved with potential reduction of the processing time by a factor of 65. A figure of merit xi is introduced for a quantitative guidance in the choice of fabrication parameters. (C) 2013 Optical Society of America (literal)
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