Effects of plasma non-homogeneity on the physical properties of sputtered thin films (Articolo in rivista)

Type
Label
  • Effects of plasma non-homogeneity on the physical properties of sputtered thin films (Articolo in rivista) (literal)
Anno
  • 2001-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1016/S0257-8972(01)01258-0 (literal)
Alternative label
  • Rigato V.; Maggioni G.; Patelli A.; Antoni V.; Serianni G.; Spolaore M.; Tramontin L.; Depero L.; Bontempi E. (2001)
    Effects of plasma non-homogeneity on the physical properties of sputtered thin films
    in Surface & coatings technology; ELSEVIER SCIENCE, Losanna (Svizzera)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Rigato V.; Maggioni G.; Patelli A.; Antoni V.; Serianni G.; Spolaore M.; Tramontin L.; Depero L.; Bontempi E. (literal)
Pagina inizio
  • 943 (literal)
Pagina fine
  • 949 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#altreInformazioni
  • 7th International Conference on Plasma Surface Engineering (PSE 2000), PARTENKIRCHEN, GERMANY, SEP 17-21, 2000. La rivista è pubblicata anche online con ISSN 1879-3347. (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url
  • http://ac.els-cdn.com/S0257897201012580/1-s2.0-S0257897201012580-main.pdf?_tid=f8253488-13f0-11e3-8ff2-00000aacb35d&acdnat=1378141323_664530a14fb8f26da6926bfb0f06766d (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 142 (literal)
Rivista
Note
  • ISI Web of Science (WOS) (literal)
  • Scopu (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • Rigato, V (Reprint Author), Ist Nazl Fis Nucl, Lab Nazl Legnaro, Via Romea 4, I-35020 Legnaro, Pd, Italy. Ist Nazl Fis Nucl, Lab Nazl Legnaro, I-35020 Legnaro, Pd, Italy. Univ Padua, Dipartimento Elettron & Informat, INFM, Unita Padova, I-35131 Padua, Italy. Consorzio RFX, I-35127 Padua, Italy. Univ Brescia, Unita Brescia, INFM, I-25123 Brescia, Italy. Univ Brescia, Lab Strutturistica Chim, I-25123 Brescia, Italy. (literal)
Titolo
  • Effects of plasma non-homogeneity on the physical properties of sputtered thin films (literal)
Abstract
  • The plasma generated in a two-target closed field unbalanced magnetron sputtering system for thin film deposition is characterized by means of Hall probes and cylindrical Langmuir probes as a function of the position inside the vacuum system. The plasma potential, electron density and temperature profiles in different locations are measured by two diagnostic systems equipped with cylindrical Langmuir probes. The plasma non-homogeneity due to the presence of magnetic field gradients is evaluated. In order to test the effects of measured plasma non-homogeneity on the physical properties of sputter-deposited coatings, several substrates are put inside the chamber in regions characterized by different plasma density and plasma potential. The composition, microstructure and morphology of TiNx films grown onto these substrates are then studied by means of nuclear techniques (RBS, n-RBS, NRA, ERDA), X-ray diffraction (XRD) and secondary electron microscopy (SEM). The mechanical properties are determined by micro-scratch test and nanoindentation and correlated to the local plasma parameters. (C) 2001 Elsevier Science B.V. All rights reserved. (literal)
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