MOCVD of Cr-based coatings using Cr(NEt2)4 as single source precursor (Contributo in atti di convegno)

Type
Label
  • MOCVD of Cr-based coatings using Cr(NEt2)4 as single source precursor (Contributo in atti di convegno) (literal)
Anno
  • 1996-01-01T00:00:00+01:00 (literal)
Alternative label
  • Maury F.; Ossola F. (1996)
    MOCVD of Cr-based coatings using Cr(NEt2)4 as single source precursor
    in 5th International Symposium on Trends and New Applications in Thin Films, TATF'96, Colmar, Fr, 1-3 April 1996
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Maury F.; Ossola F. (literal)
Pagina inizio
  • 179 (literal)
Pagina fine
  • 181 (literal)
Rivista
Note
  • Scopu (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • 1 : ENSIACET Ecole Nationale Supérieure des Ingénieurs en Arts Chimiques et Technologiques, CIRIMAT, Toulouse, France / 2 : CNR - ICIS, c.so Stati Uniti, 4 - 35127 Padova, Italy (literal)
Titolo
  • MOCVD of Cr-based coatings using Cr(NEt2)4 as single source precursor (literal)
Abstract
  • Chromium carbo-nitride coatings with low nitrogen contents have been deposited by low pressure MOCVD using Cr(NEt2)4 as single source precursor. Depositions were carried out in the temperature range 300-520°C either under high vacuum without carrier gas or using a partial pressure of nitrogen or hydrogen as carrier gas. All the films are X-ray amorphous and they exhibit a uniform and specular surface morphology with a metallic shiny aspect. The major volatile by-products were analyzed and a decomposition mechanism is proposed. Preliminary properties of these films are also reported. (literal)
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