(NH4)(2)S-x-treated InP(100) surfaces studied by soft x-ray photoelectron spectroscopy (Articolo in rivista)

Type

• Articolo in rivista (Classe)
• Prodotto della ricerca (Classe)

Label

• (NH4)(2)S-x-treated InP(100) surfaces studied by soft x-ray photoelectron spectroscopy (Articolo in rivista) (literal)

Anno

• 1996-01-01T00:00:00+01:00 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi

• 10.1007/BF02666509 (literal)

Alternative label

• Maeyama, S (Maeyama, S); Sugiyama, M (Sugiyama, M); Heun, S (Heun, S); Oshima, M (Oshima, M) (1996)
  (NH4)(2)S-x-treated InP(100) surfaces studied by soft x-ray photoelectron spectroscopy
  in Journal of electronic materials
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• Maeyama, S (Maeyama, S); Sugiyama, M (Sugiyama, M); Heun, S (Heun, S); Oshima, M (Oshima, M) (literal)

Pagina inizio

• 593 (literal)

Pagina fine

• 596 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 25 (literal)

Rivista

• Journal of electronic materials (Rivista)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo

• 4 (literal)

Note

• ISI Web of Science (WOS) (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• NTT Interdisciplinary Research Labs (literal)

Titolo

• (NH4)(2)S-x-treated InP(100) surfaces studied by soft x-ray photoelectron spectroscopy (literal)

Abstract

• The sulfur chemical bonding state on (NH4)(2)S-x-treated InP(100) surfaces has been studied by S Is core-level photoelectron measurements using synchrotron radiation soft x-rays. The change in the sulfur chemical bonding states caused by rinsing with water and annealing in vacuum after the (NH4)(2)S-x-treatment was observed clearly in the S 1s spectra. Four kinds of sulfur bonding states were resolved in the S Is spectrum of the as-treated surface. Only one sulfur bonding state was detected on the surfaces with and without the water rinse after annealing, indicating that the InP surfaces were terminated by the S-In bond. The effect of rinsing the (NH4)(2)S-x-treated InP surface is discussed by comparison with the (NH4)(2)S-x-treated GaAs surface. (literal)

Prodotto di

• Sintesi e studio delle proprieta' strutturali, ottiche ed elettroniche di sistemi aventi almeno una dimensione nanometrica (MD.P06.018.001) (Modulo)

Autore CNR

• STEFAN HEUN (Unità di personale interno)

Insieme di parole chiave

• Parole chiave di "(NH4)(2)S-x-treated InP(100) surfaces studied by soft x-ray photoelectron spectroscopy" (Insieme di parole chiave)

Incoming links:

Autore CNR di

• STEFAN HEUN (Unità di personale interno)

Prodotto

• Sintesi e studio delle proprieta' strutturali, ottiche ed elettroniche di sistemi aventi almeno una dimensione nanometrica (MD.P06.018.001) (Modulo)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Journal of electronic materials (Rivista)

Insieme di parole chiave di

• Parole chiave di "(NH4)(2)S-x-treated InP(100) surfaces studied by soft x-ray photoelectron spectroscopy" (Insieme di parole chiave)