Effects of air exposure and Cs deposition on the electronic structure of multiwalled carbon nanotubes (Articolo in rivista)

Type
Label
  • Effects of air exposure and Cs deposition on the electronic structure of multiwalled carbon nanotubes (Articolo in rivista) (literal)
Anno
  • 2002-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1142/S0218625X02002427 (literal)
Alternative label
  • Suzuki, S (Suzuki, S); Watanabe, Y (Watanabe, Y); Kiyokura, T (Kiyokura, T); Nath, KG (Nath, KG); Ogino, T (Ogino, T); Heun, S (Heun, S); Zhu, W (Zhu, W); Bower, C (Bower, C); Zhou, O (Zhou, O) (2002)
    Effects of air exposure and Cs deposition on the electronic structure of multiwalled carbon nanotubes
    in Surface review and letters
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Suzuki, S (Suzuki, S); Watanabe, Y (Watanabe, Y); Kiyokura, T (Kiyokura, T); Nath, KG (Nath, KG); Ogino, T (Ogino, T); Heun, S (Heun, S); Zhu, W (Zhu, W); Bower, C (Bower, C); Zhou, O (Zhou, O) (literal)
Pagina inizio
  • 431 (literal)
Pagina fine
  • 435 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 9 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
  • 1 (literal)
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • [ 1 ] NTT Basic Res Labs, Atsugi, Kanagawa 2430198, Japan [ 2 ] Sincrotrone Trieste, I-34012 Trieste, Italy [ 3 ] Bell Labs, Lucent Technol, Murray Hill, NJ 07974 USA [ 4 ] Univ N Carolina, Dept Phys & Astron, Chapel Hill, NC 27599 USA [ 5 ] Univ N Carolina, Curriculum Appl & Mat Sci, Chapel Hill, NC 27599 USA (literal)
Titolo
  • Effects of air exposure and Cs deposition on the electronic structure of multiwalled carbon nanotubes (literal)
Abstract
  • Electronic structural changes in multiwalled carbon nanotubes caused by adsorbates and Cs deposition were studied by photoemission spectroscopy. The adsorbates formed by air exposure slightly increased the work function. The increased work function is considered to be due to the surface dipole moment induced by the negatively charged adsorbates. On the other hand, the Cs deposition followed by the intercalation drastically decreased the work function. The results suggest that field emission current enhancement induced by adsorbates and by Cs deposition are based on essentially different mechanisms; that is, the former is associated with the formation of localized electronic states and the latter is mainly due to the work function decrease. (literal)
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