http://www.cnr.it/ontology/cnr/individuo/prodotto/ID237252
NOVEL CHINESE-HAMSTER ULTRAVIOLET-SENSITIVE MUTANTS FOR EXCISION REPAIR FORM COMPLEMENTATION GROUP-9 AND GROUP-10 (Articolo in rivista)
- Type
- Label
- NOVEL CHINESE-HAMSTER ULTRAVIOLET-SENSITIVE MUTANTS FOR EXCISION REPAIR FORM COMPLEMENTATION GROUP-9 AND GROUP-10 (Articolo in rivista) (literal)
- Anno
- 1991-01-01T00:00:00+01:00 (literal)
- Alternative label
Stefanini M, Collins A, Riboni R, Klaude M, Botta E, Mitchell DL and Nuzzo F (1991)
NOVEL CHINESE-HAMSTER ULTRAVIOLET-SENSITIVE MUTANTS FOR EXCISION REPAIR FORM COMPLEMENTATION GROUP-9 AND GROUP-10
in Cancer research (Chic. Ill.); American association for cancer research, Philadelphia [Pa.] (Stati Uniti d'America)
(literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Stefanini M, Collins A, Riboni R, Klaude M, Botta E, Mitchell DL and Nuzzo F (literal)
- Pagina inizio
- Pagina fine
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
- Rivista
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
- Note
- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- Stefanini, Riboni, Botta, Nuzzo: IGBE CNR Pavia
Collins, Klaude: Dept Mol Cell Biology, University of Aberdeen, Aberdeen, Scotland
Mitchell: Lab Radiobiology Environmental Health, University of California, San Francisco, CA (literal)
- Titolo
- NOVEL CHINESE-HAMSTER ULTRAVIOLET-SENSITIVE MUTANTS FOR EXCISION REPAIR FORM COMPLEMENTATION GROUP-9 AND GROUP-10 (literal)
- Abstract
- In this paper we demonstrate that the mutants CHO7PV and CHO4PV isolated by us from the CHO-K1 prol- cell line represent two new complementation groups of UV-sensitive excision repair-defective rodent mutants. We have classified the mutant CH07PV as representative of Group 9 and CHO4PV as representative of Group 10. Cellular and biochemical characterization of these mutants indicates that they are moderately sensitive to a broad spectrum of mutagens (UV and mono- and bifunctional alkylating agents), partially unable to perform UV-induced DNA repair synthesis, and partially defective in the incision step of the DNA excision repair pathway and in the removal of the two main lesions caused by UV [cyclobutane pyrimidine dimers and (6-4) photoproducts]. In terms of UV survival and incision, CHO4PV is apparently more defective than CHO7PV (40% and 50% of wild-type survival, respectively, and 55% and 75% of wild-type incision), whereas when repair DNA synthesis and lesion removal are compared, CHO7PV seems to be more severely affected (30% of wild-type unscheduled DNA synthesis in CHO7PV and 60% in CHO4PV). This suggests a subtlety in the relation between removal of these specific lesions and overall repair capacity and survival. (literal)
- Editore
- Prodotto di
- Autore CNR
Incoming links:
- Prodotto
- Autore CNR di
- Editore di
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi