http://www.cnr.it/ontology/cnr/individuo/prodotto/ID236742
Controlling images parameters in the reconstruction process of digital holograms (Articolo in rivista)
- Type
- Label
- Controlling images parameters in the reconstruction process of digital holograms (Articolo in rivista) (literal)
- Anno
- 2004-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1109/JSTQE.2004.833876 (literal)
- Alternative label
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Pietro Ferraro; Giuseppe Coppola; Domenico Alfieri; Sergio De Nicola; Andrea Finizio; Giovanni Pierattini (literal)
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- Pagina fine
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url
- http://ieeexplore.ieee.org/xpl/login.jsp?tp=&arnumber=1343970&url=http%3A%2F%2Fieeexplore.ieee.org%2Fxpls%2Fabs_all.jsp%3Farnumber%3D1343970 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
- Rivista
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
- Note
- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- National Research Council (CNR), Naples 80131, Italy (literal)
- Titolo
- Controlling images parameters in the reconstruction process of digital holograms (literal)
- Abstract
- Digital holograms recorded with a charge-coupled device array are numerically reconstructed in amplitude and phase through calculation of the Fresnel-Kirchhoff integral. The flexibility offered by the reconstruction process in digital holography allows exploitation of new possibilities of application in microscopy. Through the reconstruction process we will show that it is possible to control image parameters as focus distance, image size, and image resolution. Those explored potentialities open further the novel prospective of application of digital holography in single- and multiwavelengths operation either for display or metrological applications. We demonstrate the concept of controlling parameters in image reconstruction of digital holograms in some real situations for inspecting silicon microelectronic-mechanical systems structures. (literal)
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