Boron deposition on the graphite tiles of the RFX device studied by secondary ion mass spectrometry (Articolo in rivista)

Type

• Prodotto della ricerca (Classe)
• Articolo in rivista (Classe)

Label

• Boron deposition on the graphite tiles of the RFX device studied by secondary ion mass spectrometry (Articolo in rivista) (literal)

Anno

• 2008-01-01T00:00:00+01:00 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi

• 10.1016/j.jnucmat.2007.06.018 (literal)

Alternative label

• Ghezzi F.(1), Tolstogouzov A. (29 (2008)
  Boron deposition on the graphite tiles of the RFX device studied by secondary ion mass spectrometry
  in Journal of nuclear materials
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• Ghezzi F.(1), Tolstogouzov A. (29 (literal)

Pagina inizio

• 402 (literal)

Pagina fine

• 406 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url

• http://www.sciencedirect.com/science/article/pii/S0022311507008458 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 373 (literal)

Rivista

• Journal of nuclear materials (Rivista)

Note

• ISI Web of Science (WOS) (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• (1) Istituto di Fisica del Plasma (IFP-CNR), Via R. Cozzi 53, 20125 Milano, Italy - (2) Dipartimento di Chimica, Universita` di Firenze, Via della Lastruccia 3, 50019 Sesto Fiorentino, Italy (literal)

Titolo

• Boron deposition on the graphite tiles of the RFX device studied by secondary ion mass spectrometry (literal)

Abstract

• We report on a systematic surface analysis of the graphite tiles coming from different locations on the first wall of the reversed-field pinch device RFX by secondary ion mass spectrometry. Both boron and the main contaminant species were investigated. The largest values of the total boron intensity are found for tiles positioned in front of the injection valve, the lowest for those at the gap. The in-depth profiles of the normalized boron signals are interpreted as signatures of a plasma–wall interaction, namely of the plasma coming in contact with the wall in restricted regions, mainly determined by the magnetic field configuration, during its lifetime. (literal)

Prodotto di

• Sviluppo di Impianti e Strumentazione per i Plasmi e per la Fusione Termonucleare (ET.P05.002.001) (Modulo)
• Institute for plasma physics \"Piero Caldirola\" (IFP) (Istituto)

Autore CNR

• FRANCESCO MAURO GHEZZI (Persona)

Incoming links:

Prodotto

• Institute for plasma physics \"Piero Caldirola\" (IFP) (Istituto)
• Sviluppo di Impianti e Strumentazione per i Plasmi e per la Fusione Termonucleare (ET.P05.002.001) (Modulo)

Autore CNR di

• FRANCESCO MAURO GHEZZI (Persona)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Journal of nuclear materials (Rivista)