Anatomy of mc-Si thin films by plasma enhanced chemical vapor deposition: An investigation by spectroscopic ellipsometry (Articolo in rivista)

Type

• Articolo in rivista (Classe)
• Prodotto della ricerca (Classe)

Label

• Anatomy of mc-Si thin films by plasma enhanced chemical vapor deposition: An investigation by spectroscopic ellipsometry (Articolo in rivista) (literal)

Anno

• 2000-01-01T00:00:00+01:00 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi

• 10.1063/1.1287129 (literal)

Alternative label

• Losurdo M.1, Rizzoli R.2, Summonte C.2, Cicala G.1, Capezzuto P.3, Bruno G.1 (2000)
  Anatomy of mc-Si thin films by plasma enhanced chemical vapor deposition: An investigation by spectroscopic ellipsometry
  in Journal of applied physics
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• Losurdo M.1, Rizzoli R.2, Summonte C.2, Cicala G.1, Capezzuto P.3, Bruno G.1 (literal)

Pagina inizio

• 2408 (literal)

Pagina fine

• 2414 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 88 (literal)

Rivista

• Journal of applied physics (Rivista)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali

• 7 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo

• 5 (literal)

Note

• ISI Web of Science (WOS) (literal)
• Scopu (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• 1Plasma Chemistry Research Center, CNR, via Orabona, 4-70126 Bari, Italy; 2LAMEL Institute, CNR, I-40129 Bologna, Italy; 3Dipartimento di Chimica Università di Bari, via Orabona, 4-70126 Bari, Italy (literal)

Titolo

• Anatomy of mc-Si thin films by plasma enhanced chemical vapor deposition: An investigation by spectroscopic ellipsometry (literal)

Abstract

• A detailed analysis of the anatomy of microcrystalline (mc-Si) films deposited by plasma enhanced chemical vapor deposition from both SiF4-H2 and SiH4-H2 mixtures is performed by spectroscopic ellipsometry (SE). Specifically, the mc-Si film anatomy consists of an interface layer at the substrate/mc-Si bulk layer, a bulk mc-Si layer, and a surface porous layer. All these layers have their own microstructures, which need to be highlighted, since it is this overall anatomy which determines the optical properties of mc-Si films. The ability of SE to discriminate the complex microstructure of mc-Si thin films is emphasized also by the comparison with the x-ray diffraction data which cannot provide unambiguous information regarding the distribution of the crystalline and the amorphous phases along the mc-Si film thickness. Through the description of the mc-Si film anatomy, information on the effect of the growth precursors (SiF4 or SiH4) and of the substrate (c-Si or Corning glass) on the growth dynamics can be obtained. The key role of the F-atoms density and, therefore, of the etching-to-deposition competition on the growth mechanism and film microstructure is highlighted. (literal)

Prodotto di

• Istituto di Nanotecnologia (NANOTEC) (Istituto)
• Dinamica di Plasmi e Laser-Plasmi (MD.P03.027.001) (Modulo)

Autore CNR

• GRAZIA CICALA (Unità di personale interno)

Insieme di parole chiave

• Keywords of "Anatomy of mc-Si thin films by plasma enhanced chemical vapor deposition: An investigation by spectroscopic ellipsometry" (Insieme di parole chiave)

Incoming links:

Prodotto

• Istituto di Nanotecnologia (NANOTEC) (Istituto)
• Dinamica di Plasmi e Laser-Plasmi (MD.P03.027.001) (Modulo)

Autore CNR di

• GRAZIA CICALA (Unità di personale interno)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Journal of applied physics (Rivista)

Insieme di parole chiave di

• Keywords of "Anatomy of mc-Si thin films by plasma enhanced chemical vapor deposition: An investigation by spectroscopic ellipsometry" (Insieme di parole chiave)