Patterned magnetic permalloy films: fabrication by e-beam and x-ray lithographic techniques (Articolo in rivista)

Type
Label
  • Patterned magnetic permalloy films: fabrication by e-beam and x-ray lithographic techniques (Articolo in rivista) (literal)
Anno
  • 2002-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1143/JJAP.41.5149 (literal)
Alternative label
  • Patrizio CANDELORO(1), Annamaria GERARDINO(2)?, Enzo Di FABRIZIO(3), Stefano CABRINI(3), Giorgio GIANNINI(2), Luigi MASTROGIACOMO(2), Miguel CIRIA(3), Robert C. O'HANDLEY(3), Gianluca GUBBIOTTI(1) and Giovanni CARLOTTI(1) (2002)
    Patterned magnetic permalloy films: fabrication by e-beam and x-ray lithographic techniques
    in Japanese journal of applied physics
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Patrizio CANDELORO(1), Annamaria GERARDINO(2)?, Enzo Di FABRIZIO(3), Stefano CABRINI(3), Giorgio GIANNINI(2), Luigi MASTROGIACOMO(2), Miguel CIRIA(3), Robert C. O'HANDLEY(3), Gianluca GUBBIOTTI(1) and Giovanni CARLOTTI(1) (literal)
Pagina inizio
  • 5149 (literal)
Pagina fine
  • 5152 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 41 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • (1) INFM, Dipartimento di Fisica, Universita` di Perugia, Via A. Pascoli, 06100 Perugia Italy (2) CNR-IESS, Istituto di Elettronica dello Stato Solido, Via Cineto Romano, 42 00156 Roma, Italy (3) TASC-INFM, Area della Ricerca, Basovizza, 43100 Trieste Italy (4) Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge MA 02139, U.S.A. (literal)
Titolo
  • Patterned magnetic permalloy films: fabrication by e-beam and x-ray lithographic techniques (literal)
Abstract
  • Electron beam (e-beam) and X-ray lithographic techniques have been used to fabricate permalloy (Ni80Fe20) and nickel rectangular and triangular dots and antidots on an area of (1 ? 1)mm2. Dot dimensions and spacings range from 500 nm to 1?m and from 250 nm to 50 nm, respectively. The changes of the magnetic properties induced by patterning have been studied by means of magneto-optic Kerr effect (MOKE) magnetometry and the Brillouin light scattering (BLS) technique. (literal)
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