MOCVD deposition of TiO2 thin films on titanium dental implants (Contributo in atti di convegno)

Type
Label
  • MOCVD deposition of TiO2 thin films on titanium dental implants (Contributo in atti di convegno) (literal)
Anno
  • 1996-01-01T00:00:00+01:00 (literal)
Alternative label
  • Battiston G.A.; Gerbasi R.; Porchia M.; Rizzo L.; Tiziani A.; Zambon A. (1996)
    MOCVD deposition of TiO2 thin films on titanium dental implants
    in TATF'96, Colmar, Fr, 1-3 April 1996
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Battiston G.A.; Gerbasi R.; Porchia M.; Rizzo L.; Tiziani A.; Zambon A. (literal)
Pagina inizio
  • 215 (literal)
Pagina fine
  • 217 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#titoloVolume
  • Proceedings of the 1996 5th International Symposium on Trends and New Applications in Thin Films (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali
  • 3 (literal)
Note
  • Scopu (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • CNR, Padova, Italy (literal)
Titolo
  • MOCVD deposition of TiO2 thin films on titanium dental implants (literal)
Abstract
  • Uniform, good-quality TiO2 thin films were deposited on dental implants by employing Metal-Organic Chemical Vapour Deposition (MOCVD) technique at 420°C and using titaniumtetraisopropoxide as precursor. The films resulted anatase high oriented in (200) direction. These dental implants were therefore tested 'in vivo' and showed higher adhesion values in the first three months, with torque resistance increased by about 50% with respect to the untreated implants. Structural data are discussed to explain such good performance. (literal)
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