http://www.cnr.it/ontology/cnr/individuo/prodotto/ID222726
Nearest-neighbor distances in strained thin films of random pseudobinary semiconductor alloys: A calculational methodology (Articolo in rivista)
- Type
- Label
- Nearest-neighbor distances in strained thin films of random pseudobinary semiconductor alloys: A calculational methodology (Articolo in rivista) (literal)
- Anno
- 2004-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1063/1.1760236 (literal)
- Alternative label
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Pagina inizio
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
- Rivista
- Note
- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- INFM OGG, c/o GILDA CRG--ESRF, Bo?´te Postale 220, F-38043 Grenoble, France (literal)
- Titolo
- Nearest-neighbor distances in strained thin films of random pseudobinary semiconductor alloys: A calculational methodology (literal)
- Abstract
- A method, based on macroscopic elastic theory, is presented, which predicts the nearest-neighbor
distances in strained pseudobinary semiconductor thin films. The method applies to films grown on
the~001!face of substrates with the zincblende or diamond structure. Based on crystallographic and
elastic parameters, the bond lengths are determined through minimization of the elastic energy
calculated in the framework of the valence force field method. Good agreement with experimental
data is obtained by considering only bond stretching terms. The effectiveness of this method is
shown in a number of cases taken from literature. (literal)
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