http://www.cnr.it/ontology/cnr/individuo/prodotto/ID222605
Indium in silicon: interactions with native defects and with C impurities (Contributo in atti di convegno)
- Type
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- Indium in silicon: interactions with native defects and with C impurities (Contributo in atti di convegno) (literal)
- Anno
- 2004-01-01T00:00:00+01:00 (literal)
- Alternative label
Alippi, P; La Magna, A; Scalese, S; Privitera, V (2004)
Indium in silicon: interactions with native defects and with C impurities
in Symposium on Silicon Front-End Junction Formation-Physics and Technology held at the 2004 MRS Spring Meeting, San Francisco, CA, APR 13-15, 2004
(literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Alippi, P; La Magna, A; Scalese, S; Privitera, V (literal)
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- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#titoloVolume
- SILICON FRONT-END JUNCTION FORMATION-PHYSICS AND TECHNOLOGY Book Series: MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#volumeInCollana
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- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- CNR, IMM, Sez Catania, I-95121 Catania, Italy (literal)
- Titolo
- Indium in silicon: interactions with native defects and with C impurities (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#isbn
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#curatoriVolume
- Pichler, P; Claverie, A; Lindsay, R; Orlowski, M; Windl, W (literal)
- Abstract
- Equilibrium geometries and formation energies of neutral and charged In complexes with silicon native defects (vacancy (V) and self-interstitials (I)) and with C impurities are investigated within density functional theory, using the Vienna Ab-initio Simulation Package. We determine formation energies and ionization levels of different complexes and discuss the contribution of I and V to indium diffusion. We also identify the In-C defect responsible for the increased electrical activation in In+C-doped silicon samples. The ab initio energetics is then implemented in a continuum diffusion code in order to simulate the diffusion of as-implanted In profiles under different thermal treatments. (literal)
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