http://www.cnr.it/ontology/cnr/individuo/prodotto/ID222521
Evolution of Ge/ S (001)islands during Si capping at high temperature (Articolo in rivista)
- Type
- Label
- Evolution of Ge/ S (001)islands during Si capping at high temperature (Articolo in rivista) (literal)
- Anno
- 2005-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1063/1.2141652 (literal)
- Alternative label
G. Capellini, M. De Seta, L. Di Gaspare, and F. Evangelisti,F. d'Acapito (2005)
Evolution of Ge/ S (001)islands during Si capping at high temperature
in Journal of applied physics
(literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- G. Capellini, M. De Seta, L. Di Gaspare, and F. Evangelisti,F. d'Acapito (literal)
- Pagina inizio
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
- Rivista
- Note
- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- Università Roma Tre, Via della Vasca Navale 84, I-00146 Roma, Italy
CNR-INFM-OGG c/o European Synchrotron Radiation Facility GILDA CRG, 6, Rue Jules Horowitz,
F-38043 Grenoble, France (literal)
- Titolo
- Evolution of Ge/ S (001)islands during Si capping at high temperature (literal)
- Abstract
- We discuss the effect of the deposition of a Si cap layer on the composition and morphological
properties of Ge?Si?/Si?001? self-assembled islands deposited by chemical vapor deposition at
750 ° C. The morphological evolution of the island shape was investigated by means of atomic force
microscopy and the actual island composition has been measured by means of x-ray photoemission
spectroscopy and x-ray absorption spectroscopy techniques. At an early stage of Si capping, Si
atoms are incorporated in the island layer. As a consequence, we observe a reverse
Stranski-Krastanov growth dynamics in agreement with the volume-composition stability diagram
proposed for domes, pyramids, and prepyramids in the Gex
Si1-x /Si?100? system. We find that the island burying begins when the Ge average composition reaches the valuex= 0.28. Once the islands are buried under a thin silicon layer their composition is unaffected by subsequent silicon
deposition. We conclude that strain relief, rather than thermal diffusion, is the main driving force for
the observed Ge-Si alloying. (literal)
- Prodotto di
- Autore CNR
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