Evolution of Ge/ S (001)islands during Si capping at high temperature (Articolo in rivista)

Type
Label
  • Evolution of Ge/ S (001)islands during Si capping at high temperature (Articolo in rivista) (literal)
Anno
  • 2005-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1063/1.2141652 (literal)
Alternative label
  • G. Capellini, M. De Seta, L. Di Gaspare, and F. Evangelisti,F. d'Acapito (2005)
    Evolution of Ge/ S (001)islands during Si capping at high temperature
    in Journal of applied physics
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • G. Capellini, M. De Seta, L. Di Gaspare, and F. Evangelisti,F. d'Acapito (literal)
Pagina inizio
  • 124901 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 98 (literal)
Rivista
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • Università Roma Tre, Via della Vasca Navale 84, I-00146 Roma, Italy CNR-INFM-OGG c/o European Synchrotron Radiation Facility GILDA CRG, 6, Rue Jules Horowitz, F-38043 Grenoble, France (literal)
Titolo
  • Evolution of Ge/ S (001)islands during Si capping at high temperature (literal)
Abstract
  • We discuss the effect of the deposition of a Si cap layer on the composition and morphological properties of Ge?Si?/Si?001? self-assembled islands deposited by chemical vapor deposition at 750 ° C. The morphological evolution of the island shape was investigated by means of atomic force microscopy and the actual island composition has been measured by means of x-ray photoemission spectroscopy and x-ray absorption spectroscopy techniques. At an early stage of Si capping, Si atoms are incorporated in the island layer. As a consequence, we observe a reverse Stranski-Krastanov growth dynamics in agreement with the volume-composition stability diagram proposed for domes, pyramids, and prepyramids in the Gex Si1-x /Si?100? system. We find that the island burying begins when the Ge average composition reaches the valuex= 0.28. Once the islands are buried under a thin silicon layer their composition is unaffected by subsequent silicon deposition. We conclude that strain relief, rather than thermal diffusion, is the main driving force for the observed Ge-Si alloying. (literal)
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